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US 8,619,231 B2Granted
Cleaning method, exposure method, and device manufacturing method
AssigneeNikon Corporation
InventorShunji Watanabe
Life of this patent
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Abstract
A cleaning method includes cleaning a member, used at the time of exposing a substrate via liquid, which is in contact with the liquid. The method includes cleaning the member with an alkali solution followed by cleaning the member with a solution including hydrogen peroxide.
Claims8
A method of cleaning a member, used at a time of exposing a substrate via liquid, which is in contact with the liquid, the method comprising:
- cleaning the member with an alkali solution;
- and
- after the cleaning with the alkali solution, removing the alkali solution from the member by cleaning the member with a solution including hydrogen peroxide, wherein
- a concentration of hydrogen peroxide in the solution including hydrogen peroxide is at least 15 wt %.
1 more element
Dependencies are inferred from the claim text.