Pattern structures in semiconductor devices
AssigneeSamsung Electronics Co., Ltd.
InventorsJaehwang Sim, Jaeho Min, Jaehan Lee, Keonsoo Kim
Life of this patent
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Abstract
A pattern structure in a semiconductor device includes an extending line and a pad connected with an end portion of the extending line. The pad may have a width that is larger than a width of the extending line. The pad includes a protruding portion extending from a lateral portion of the pad. The pattern structure may be formed by simplified processes and may be employed in various semiconductor devices requiring minute patterns and pads.
Claims29
A pattern structure of a semiconductor device, comprising:
- a first pattern structure having a first line pattern, a first extending line extended from the first line pattern, and a first pad connected to the first extending line and having a circumferential line, a concave portion, and a protrusion disposed between the circumferential line and the concave portion;
- and
- a second pattern disposed adjacent to the first pattern structure, having a second line pattern, a second extending line extended from the second line pattern, and a second pad connected to the second extending line and having a second circumferential line, a second concave portion, and a second protrusion disposed between the second circumferential line and the second concave portion.
A pattern structure of a semiconductor device, comprising:
- a first pattern structure connected to a controller, the first pattern structure comprising:
- a first line pattern disposed in a first direction and having a first width in a second direction having an angle with the first direction,
- a first extending line extended from the line pattern in the second direction and having a second width in the first direction wider than the first width, and
- a first pad formed on an end portion of the extending line and having a third width wider than the second width;
- and
- a second pattern structure disposed to face the first pattern structure and connected to the controller, the second pattern structure comprising:
- a second line pattern formed on a substrate and having a fourth width,
- a second extended line extended from an end portion of the line pattern and having a fifth width,
- a second pad formed on an end portion of the extended line and having a six width and a seventh width narrower than the sixth width, and
- a protruding portion to protrude from a portion of the pad of the seven width.
A pattern structure of a semiconductor device, comprising:
- a line pattern unit formed on a substrate to transmit data;
- and
- a pad formed to be connected to the line pattern unit to receive and output the data, having a circumferential line to define a shape of the pad, and having a concave portion formed in the circumference line, wherein the line pattern unit includes:
- a line pattern;
- and
- an extending line disposed between the line pattern and the pad, and having a width different from at least one of the line pattern and the pad,
- wherein the circumferential line of the pad forms an area of the pad, and
- the area of the pad has a first portion in which a width of the area in a direction parallel to a longitudinal direction of the line pattern unit does not vary, and a second portion in which a direction parallel to a longitudinal direction of the line pattern unit varies according to a distance from the line pattern unit.
Dependencies are inferred from the claim text.