Electron beam irradiation apparatus
AssigneeHitachi High-Technologies Corporation
InventorsShahedul Hoque, Hajime Kawano
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Abstract
The present invention has for its object to provide an electron beam irradiation apparatus which can suppress influences the electric fields generated by a plurality of backscattered electron detectors have. To attain the above object, an electron beam irradiation apparatus equipped with a scanning deflector comprises a plurality of backscattered electron detectors, a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively, and a controller device which adjusts application voltages the power source for detectors delivers, on the basis of an image shift when the voltages are applied to the plural backscattered electron detectors.
Claims5
An electron beam irradiation apparatus equipped with a scan deflector adapted to scan an electron beam emitted from an electron source, comprising:
- a plurality of backscattered electron detectors;
- a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively;
- and
- a controller device which adjusts application voltages that said power source applies to said plural backscattered electron detectors on the basis of an image shift.
Dependencies are inferred from the claim text.