US 8,618,496 B2 · Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams

Abstract

A charged particle system such as a multi beam lithography system. A manipulator device manipulates one or more charged particle beams. The manipulator device includes at least one through opening in the plane of the planar substrate for passing at least one charged particle. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of the through opening and in a second set of multiple second electrodes along a second part of the perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.

Claims36

Dependent claims

Charged particle system such as a multi beam lithography system, comprising a manipulator device for manipulation of one or more charged particle beams, wherein the manipulator device comprises:

a planar substrate comprising at least one through opening in the plane of the planar substrate, wherein each through opening is arranged for passing at least one charged particle beam there through and each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of said through opening and in a second set of multiple second electrodes along a second part of said perimeter;
and,
an electronic control circuit arranged for providing voltage differences to pairs of electrodes, each pair being a first electrode from the first set and a second electrode from the second set, in dependence of a position of the first and second electrode along the perimeter of the through opening, to provide an electrical field that is substantially homogeneous across the through opening.

Charged particle system, such as a multi beam lithography system, comprising:

a manipulator device for manipulation of one or more charged particle beams, comprising a planar substrate comprising at least one through opening in the plane of the planar substrate, wherein each opening is arranged for passing at least one charged particle beam there through;
a first planar lens substrate comprising at least one first planar lens aperture, wherein the at least one first planar lens aperture is arranged in alignment with the at least one through opening of the planar substrate of the manipulator device and the first planar lens substrate is arranged above and parallel with the planar substrate of the manipulator device;
and,
a second planar lens substrate comprising at least one second planar lens aperture, wherein the at least one second planar lens aperture is arranged in alignment with the at least one through opening of the planar substrate of the manipulator device and the second planar lens substrate is arranged below and parallel with the planar substrate of the manipulator device,
wherein the system comprises means for generating an Einzel lens for said beams, said means arranged for providing a voltage difference between the first planar lens substrate and the planar substrate of the manipulator device and between the planar substrate of the manipulator device and the second planar lens substrate.

2 more elements

Dependencies are inferred from the claim text.

Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams

Life of this patent

Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams

Life of this patent

Abstract

Claims36