Method for producing a hole
AssigneeSiemens Aktiengesellschaft
InventorsThomas Beck, Nigel-Philip Cox, Silke Settegast
Life of this patent
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Abstract
There are a multiplicity of methods of making through-holes. In particular in the production of a multiplicity of film-cooling holes, as in gas turbine blades or combustion chamber elements, small time advantages are also important when making a hole. The method according to the invention, to make the hole close to the final contour in each case in sections in a top and a bottom region in order to then produce the final contour with other laser parameters, achieves time advantages.
Claims20
A method for producing a hole in a layer system, comprising:
- producing a hole outer diffuser initial contour that approximately represents a final outer diffuser contour, while leaving a diffuser buffer layer of material between the initial outer diffuser contour and the final outer diffuser contour using a first pulse length;
- producing a final contour on the hole outer diffuser by removing the diffuser buffer layer, wherein the final contour on the hole outer diffuser is produced using a pulsed electron beam or a pulsed laser beam comprising a second pulse length that is different than the first pulse length;
- producing a final hole lower region concentric with the outer diffuser using the first pulse length,
- wherein the hole outer diffuser initial contour, the hole outer diffuser final contour and the final hole lower region is produced using a pulsed electron beam or a pulsed laser beam.
A method for producing a hole in a layer system, comprising:
- producing a final contour on the hole outer diffuser using a pulsed electron beam or a pulsed laser beam comprising a first pulse length;
- producing a hole lower region concentric with the outer diffuser that approximately represents a final hole lower region contour, while leaving a lower region buffer layer of material between the initial lower region contour and the final lower region contour, wherein the hole lower region that approximately represents a final hole lower region contour is produced using a pulsed electron beam or a pulsed laser beam comprising a second pulse length;
- and
- producing a final contour on the hole lower region by removing the lower region buffer layer, wherein the final contour on the hole lower region is produced using a pulsed electron beam or a pulsed laser beam comprising the first pulse length, and
- wherein the first pulse length and the second pulse length are different.
Dependencies are inferred from the claim text.