Directed assembly of triblock copolymers
AssigneeWisconsin Alumni Research Foundation
InventorsPaul Franklin Nealey, Frank S. Bates, Juan J. de Pablo
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Abstract
Methods of directed self-assembly of multi-block (i.e., triblock and higher-order) copolymers on patterned substrates and related compositions are provided. According to various embodiments, the methods involve depositing copolymer materials on substrates configured to drive the assembly of micro-phase separated films that exhibit the same morphology as that copolymer materials in the bulk. In certain embodiments, binary patterns are used to drive the triblock copolymer films. The binary two-dimensional surface patterns are transformed into three-component and three-dimensional structures throughout the thickness of the overlying copolymer films.
Claims10
A thin film composition comprising
- (a) a patterned substrate comprising patterned features defined by no more than n−1 different chemical functionalities, n being at least three;
- and
- (b) a microphase-separated block copolymer layer comprising an n-block copolymer, and having n distinct phases overlying the patterned substrate;
- wherein each of the n distinct phases, either alone or in combination with another phase, is aligned with features of the underlying pattern such that a plane substantially perpendicular to the substrate and passing through a boundary between contacting features of the underlying pattern passes through a boundary between contacting phases of the microphase-separated block copolymer layer.
A thin film composition comprising:
- a) a lithographically patterned substrate;
- b) a microphase-separated block copolymer layer and having n distinct phases overlying the lithographically patterned substrate;
- wherein each of the n distinct phases, either alone or in combination with another phase, is aligned with features of the underlying pattern such that a plane substantially perpendicular to the substrate and passing through a boundary between contacting features of the underlying pattern passes through a boundary between contacting phases of the microphase-separated block copolymer layer, and wherein at least one phase of the microphase-separated block copolymer layer has a dimension less than the smallest dimension of the lithographic substrate pattern.
Dependencies are inferred from the claim text.