Lifting-off method and method for manufacturing TFT array substrate
AssigneesBoe Technology Group Co., Ltd., Beijing Boe Display Technology Co., Ltd.
InventorsYongzhi Song, Zhaohui Hao, Xu Wang, Huiyue Luo, Guojing Ma
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Abstract
A lifting-off method and a manufacturing method for a thin film transistor (TFT) array substrate using the same are provided. A lifting-off method comprises forming a cavitation jet flow by using a lifting-off solution, and impacting a to-be-lifted-off surface of a substrate by means of the cavitation jet flow to remove a photoresist and a film deposited on the photoresist over the to-be-lifted-off surface. The disclosure may be applied to manufacturing processes for semiconductor devices or TFT array substrate.
Claims11
A lifting-off method comprising:
- forming a cavitation jet flow by mixing an lifting-off solution and an air flow;
- and
- impacting a to-be-lifted-off surface of a substrate by means of the cavitation jet flow to remove photoresist and a film deposited on the photoresist over the to-be-lifted-off surface.
Dependencies are inferred from the claim text.