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US 8,617,994 B2Granted
Polishing liquid composition
AssigneeKao Corporation
InventorsMami Shirota, Yasuhiro Yoneda
Life of this patent
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Abstract
A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray (λ=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2θ (θ is a Bragg angle) range of 28.61 to 29.67°, a peak (second peak) having a peak top in a diffraction angle 2θ range of 33.14 to 34.53°, a peak (third peak) having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and a peak (fourth peak) having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°. A half-width of the first peak is 0.8° or less.
Claims17
A polishing method comprising:
- supplying a polishing liquid composition between an object to be polished and a polishing pad;
- and
- polishing the object to be polished by moving the polishing pad relative to the object to be polished while the object to be polished is in contact with the polishing pad,
- the polishing liquid composition comprising:
- composite oxide particles containing cerium and zirconium;
- a dispersing agent;
- and
- an aqueous medium,
- wherein a powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray, where λ=0.154050 nm, irradiation includes
- a first peak having a peak top in a diffraction angle 2θ range of 28.61 to 29.67°, wherein θ is a Bragg angle,
- a second peak having a peak top in a diffraction angle 2θ range of 33.14 in 34.53°,
- a third peak having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and
- a fourth peak having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°,
- wherein a half-width of the first peak is 0.8° or less, and
- wherein when there is at least one peak of a peak a1 derived from a cerium oxide and a peak a2 derived from a zirconium oxide in the powder X-ray diffraction spectrum, both heights of peak tops of the peaks a1, a2 are 0% of a height of the peak top of the first peak, where the peak top of the peak a1 lies in a diffraction angle 2θ range of 28.40 to 28.59° and the peak top of the peak a2 lies in a diffraction angle 2θ range of 29.69 to 31.60°.
12 more elements
A method for manufacturing a glass substrate comprising:
- polishing at least one of two principal surfaces of a base material of a glass substrate with a polishing liquid composition,
- the polishing liquid composition comprising:
- composite oxide particles containing cerium and zirconium;
- a dispersing agent;
- and
- an aqueous medium,
- wherein a powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray, where λ=0.154050 nm, irradiation includes
- a first peak having a peak top in a diffraction angle 2θ range of 28.61 to 29.67°, wherein θ is a Bragg angle,
- a second peak having a peak top in a diffraction angle 2θ range of 33.14 to 34.53°,
- a third peak having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and
- a fourth peak having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°,
- wherein a half-width of the first peak is 0.8° or less, and
- wherein when there is at least one peak of a peak a1 derived from a cerium oxide and a peak a2 derived from a zirconium oxide in the powder X-ray diffraction spectrum, both heights of peak tops of the peaks a1, a2 are 0% of a height of the peak top of the first peak, where the peak top of the peak a1 lies in a diffraction angle 2θ range of 28.40 to 28.59° and the peak top of the peak a2 lies in a diffraction angle 2θ range of 29.69 to 31.60°.
10 more elements
A method for manufacturing a semiconductor device comprising:
- a thin film formation process of forming a thin film on one principal surface side of a semiconductor substrate;
- and
- a polishing process of polishing the thin film with a polishing liquid composition,
- the polishing liquid composition comprising:
- composite oxide particles containing cerium and zirconium;
- a dispersing agent;
- and
- an aqueous medium,
- wherein a powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray, where λ=0.154050 nm, irradiation includes
- a first peak having a peak top in a diffraction angle 2θ range of 28.61 to 29.67°, wherein θ is a Bragg angle,
- a second peak having a peak top in a diffraction angle 2θ range of 33.14 to 34.58°,
- a third peak having a peak top in a diffraction angle 2θ range of 47.57 to 49.63°, and
- a fourth peak having a peak top in a diffraction angle 2θ range of 56.45 to 58.91°;
- wherein a half width of the first peak is 0.8° or less, and
- wherein when there is at least one peak of a peak a1 derived from a cerium oxide and a peak a2 derived from a zirconium oxide in the powder X-ray diffraction spectrum, both heights of peak tops of the peaks a1, a2 are 0% of a height of the peak top of the first peak, where the peak top of the peak a1 lies in a diffraction angle 2θ range of 28.40 to 28.59° and the peak top of the peak a2 lies in a diffraction angle 2θ range of 29.69 to 31.60°.
12 more elements
Dependencies are inferred from the claim text.