Photoresist composition and method for producing photoresist pattern

A photoresist composition comprising

• (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and (B) a salt represented by formula (I):
• wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group,
• n represents 0 or 1,
• L1 represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, provided that L1 is not a single bond when n is 0,
• R1 represents a hydroxy group protected by a protecting group, and
• Z+ represents an organic cation,
• said hydroxy group protected by a protecting group being represented by formula (2A):
• wherein Ra61′ and Ra62′ independently each represent a hydrogen atom or a C 1-C12 monovalent hydrocarbon group, and Ra63′ represents a C1-C20 monovalent hydrocarbon group, or
• Ra63 ′ represents a C2-C20 divalent hydrocarbon group together with Ra62′, and
• a methylene group of the monovalent hydrocarbon groups may be replaced by an oxygen atom or a sulfur atom, and a methylene group of the divalent hydrocarbon groups may be replaced by an oxygen atom or a sulfur atom, and * represents a binding position.