Photoacid generator, method for producing the same, and resist composition comprising the same
AssigneeKorea Kumho Petrochemical Co., Ltd.
InventorsJung Hoon Oh, Jin Bong Shin, Tae Gon Kim, Dong Chul Seo
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AssigneeKorea Kumho Petrochemical Co., Ltd.
InventorsJung Hoon Oh, Jin Bong Shin, Tae Gon Kim, Dong Chul Seo
Estimating the term…
A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y1, Y2, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
A photoacid generator represented by the following formula (1):
A method for producing a photoacid generator, the method comprising:
Dependencies are inferred from the claim text.