Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

An actinic ray-sensitive or radiation-sensitive resin composition, comprising

• (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid;
• (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation;
• and
• (C) a resin containing at least either a fluorine atom or a silicon atom and a polarity converting group,
• wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm,
• wherein an ester group directly bonded to the main chain of a repeating unit is not included in the polarity converting group,
• wherein the resin (C) contains (c′) a repeating unit containing at least either a fluorine atom or a silicon atom and a polarity converting group on one side chain, and
• wherein the component (B) is a compound represented by the following formula (1-1) or (1-2):
• wherein in formula (1-1),
• R13 represents a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, or a group having a monocyclic or polycyclic cycloalkyl skeleton;
• R14 represents an alkyl group, a cycloalkyl group, an alkoxy group, an alkylsulfonyl group, a cycloalkylsulfonyl group, an alkylcarbonyl group, an alkoxycarbonyl group, or an alkoxy group having a monocyclic or polycyclic cycloalkyl skeleton, and when a plurality of R14's are present, the plurality of R14's are the same or different;
• each R15 independently represents an alkyl group, a cycloalkyl group or a naphthyl group, and two R15's may combine with each other to form a ring;
• l represents an integer of 0 to 2;
• r represents an integer of 0 to 8;
• and
• X− represents a non-nucleophilic anion;
• and in formula (1-2),
• M represents an alkyl group, a cycloalkyl group, an aryl group or a benzyl group and when M has a ring structure, the ring structure may contain an oxygen atom, a sulfur atom, an ester bond, an amide bond or a carbon-carbon double bond;
• each of R1c and R2c independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an aryl group, and R1c and R2c may combine with each other to form a ring;
• each of Rx and Ry independently represents an alkyl group, a cycloalkyl group, a 2-oxoalkyl group, an alkoxycarbonylalkyl group, an allyl group or a vinyl group;
• Rx and Ry may combine with each other to form a ring, at least two members of M, R1c and R2c may combine with each other to form a ring, and the ring structure may contain a carbon-carbon double bond;
• and
• X− represents a non-nucleophilic anion.