Poly-oxycarbosilane compositions for use in imprint lithography
AssigneeInternational Business Machines Corporation
InventorsRichard Anthony Dipietro, Geraud Jean-Michel Dubois, Robert Dennis Miller, Ratnam Sooriyakumaran
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Abstract
The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.
Claims8
A composition comprising a silsesquioxane, a reaction initiator, a pore generator, and a polymer comprising a repeating unit having a structure selected from structures I and II:
- wherein each of R, R1, R2 and R3 is independently selected from hydrido, C1-6 alkyl and haloalkyl;
- C4-7 cycloalkyl and halocycloalkyl;
- C1-6 alkenyl and haloalkenyl;
- C3-4 alkylenylcarbonyloxy;
- C5-10 cycloalkylenylcarbonyloxy and C6-12 aryl and haloaryl;
- x is 1-4 and n=2-5000, wherein the reaction initiator is selected from the group consisting of a photo radical initiator, a thermal radical initiator, a photoacid generator, a photo base generator, and a thermal base generator, and wherein the composition is solvent-free.
A composition comprising a silsesquioxane, a photoacid generator, a pore generator, and a polymer comprising a repeating unit having a structure selected from structures I and II:
- wherein each of R, R1, R2, and R3 is independently selected from hydrido and C1-6 alkyl;
- x is 1-4;
- and n=2-500, and wherein the composition is solvent-free.
Dependencies are inferred from the claim text.