Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

An actinic ray-sensitive or radiation-sensitive resin composition, comprising:

• (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation;
• (B) a resin capable of increasing a dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin (B) containing a repeating unit represented by formula (3);
• and
• (D) a low molecular compound having a group capable of leaving by an action of an acid:
• wherein A represents an ester bond or a group represented by —CONH—;
• each R0 independently represents an alkylene group, a cycloalkylene group or a combination thereof, and when a plurality of R0's are present, the plurality of R0's are the same or different;
• each Z independently represents an ether bond, an ester bond, an amide bond, a urethane bond or a urea bond, and when a plurality of Z's are present, the plurality of Z's are the same or different;
• R8 represents a monovalent organic group having a lactone structure;
• n is a repetition number of the structure represented by —R0—Z— in the repeating unit represented by formula (3) and represents an integer of 1 to 5;
• and
• R7 represents a hydrogen atom, a halogen atom or an alkyl group;
• and further wherein the component (D) is an amine derivative having a group capable of decomposing by the action of an acid on the nitrogen atom.