Optimized mask design for fabricating periodic and quasi-periodic patterns
AssigneeEulitha AG
InventorHarun Solak
Life of this patent
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Abstract
A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.
Claims21
A method of printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer formed on a substrate, the method which comprises:
- a) designing a mask pattern with a periodic or quasi-periodic array of unit cells each having a ring feature;
- b) forming a mask with the mask pattern;
- c) arranging the mask with the mask pattern substantially parallel to the photosensitive layer;
- and
- d) adjusting a distance of the photosensitive layer from the mask and illuminating the mask according to a process selected from the group consisting of achromatic Talbot lithography and displacement Talbot lithography, to thereby cause an illumination being transmitted by the mask to expose the photosensitive layer to an integrated intensity distribution printing the desired pattern.
Dependencies are inferred from the claim text.