Linear plasma system
AssigneeBelight Technology Corporation, Limited
InventorQuanyuan T. Shang
Life of this patent
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Abstract
The invention relates to a linear plasma system. The linear plasma system includes a number of troughs of an electrode alternating with a number of peaks of the electrode forming a sawtooth shape, a reactive gas feed, a precursor gas feed, and a power source. The reactive gas feed is disposed on the electrode and configured to continuously release a reactive gas into an array of holes located at the trough apex. The precursor gas feed is disposed on the electrode and configured to continuously release a precursor gas into an array of holes located at the peak apex. The power source is configured to apply radio frequency power to the electrode to simultaneously interact with the reactive gas mixed with the precursor gas to generate plasma, which is used to create a product that is deposited on a substrate.
Claims14
A linear plasma system for processing a substrate, comprising:
- a first electrode having a front electrode surface, the front electrode surface having a plurality of linear concave troughs that extend along a width of the first electrode, each of the plurality of linear concave troughs having a first array of holes located on the front electrode surface and proximate to a trough apex and a second array of holes located on the front electrode surface and proximate to a peak apex;
- a second electrode located proximally to the first electrode and arranged in parallel, relative to a linear motion of the substrate during processing, with the first electrode, wherein the second electrode is substantially the same shape as the first electrode and is powered by a power source that is different from a power source that powers the first electrode;
- a reactive gas feed disposed on the first electrode and configured to continuously release, through the first array of holes, a reactive gas into a gap between the front electrode surface and the substrate;
- a precursor gas feed disposed on the first electrode and configured to continuously release, while the reactive gas feed releases the reactive gas, a precursor gas into the second array of holes;
- and
- wherein the power source that powers the first electrode is configured to apply radio frequency power to the first electrode to:
- interact with a first portion of the reactive gas mixed with a first portion of the precursor gas to generate plasma that is confined to a gap between the first array of holes on the front electrode surface and the substrate;
- generate a film product of an activated precursor and reactive gas in the gap caused by an interaction between the plasma, a second portion of the precursor gas, and a second portion of the reactive gas,
- wherein the film product of the activated precursor and reactive gas is deposited on the substrate as the substrate undergoes the linear motion underneath the first and second electrodes, and
- wherein the film product and the substrate are used to form a solar film product.
Dependencies are inferred from the claim text.