Radiation-sensitive resin composition, polymer and compound

A radiation-sensitive resin composition comprising (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of formulas (1-1) to (1-3), wherein the polymer (A) includes at least one repeating unit among repeating units shown by formulas (1p-1) to (1p-3) and (2p) as the repeating unit (a1),

• wherein RP represents a monovalent organic group, Z1 represents a carbon atom, Z2 represents a trivalent group that forms a cyclic hydrocarbon group together with Z1, Q0 in the formula (1-1) individually represent a hydrogen atom or a monovalent group, provided that at least one of Q0 represents a monovalent organic group that includes an electron-withdrawing group, Q0 in the formula (1-3) represents a monovalent organic group that includes an electron-withdrawing group, provided that a case where all of Q0 in the formula (1-1) represent a fluorine atom or a fluorine-substituted hydrocarbon group is excluded, and “*” indicates a bonding hand,
• wherein RM1 represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, or a fluoroalkyl group having 1 to 5 carbon atoms, LB represents a single bond or a (b+1)-valent linking group, RP represents a monovalent organic group, Q0 represents a hydrogen atom or a monovalent group, Q1 represents a hydrogen atom or a monovalent hydrocarbon group, and b is 1 when LB represents a single bond, and is an integer from 1 to 5 when LB does not represent a single bond, provided that a plurality of RP, a plurality of Q0, and a plurality of Q1 may respectively be either the same or different when b is an integer from 2 to 5.