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US 8,580,117 B2Granted
System and method for replacing resist filter to reduce resist filter-induced wafer defects
AssigneeTaiwan Semiconductor Manufactuing Company, Ltd.
InventorsYao-Hwan Kao, Po-Chang Huang
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Abstract
System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.
Claims5
A method for replacing a resist filter of a filtration system connected to a dispenser, the method comprising:
- replacing an old resist filter with a new resist filter;
- subsequent to the replacing, connecting the filtration system to throughput an organic solvent capable of dissolving a photoresist;
- moving a two-inlet isolation valve from a first position to a second position to flush the organic solvent through the new resist filter to clean and pre-wet the new resist filter in the filtration system;
- and
- subsequent to the connecting the filtration system to throughput the organic solvent, connecting the dispenser to receive a photoresist solution using the two-inlet isolation valve.
2 more elements
Dependencies are inferred from the claim text.