Coating composition for forming highly dielectric film and highly dielectric film

A nonporous highly dielectric film comprising a vinylidene fluoride resin (A) and a cellulose resin (B), and (A) is contained in an amount of 2 to 98 parts by mass when the total amount of (A) and (B) is assumed to be 100 parts by mass, and highly dielectric inorganic particles are not contained, wherein the highly dielectric inorganic particles are particles of strontium titanate, barium titanate, lead zirconium titanate oxides (PZT), barium zirconium titanate, barium zirconate, strontium zirconate, calcium titanate or calcium zirconate, and

• wherein the vinylidene fluoride resin (A) is a polymer comprising 60 to 100% by mole of vinylidene fluoride unit, 0 to 40% by mole of tetrafluoroethylene unit and 0 to 40% by mole of hexafluoropropylene, and
• the cellulose resin (B) is cellulose acetate or ether-substituted cellulose.