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US 8,576,373 B2Granted
Lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsHako Botma, Johannes Aldegonda Theodorus Marie Van Den Homberg
Life of this patent
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Abstract
A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.
Claims13
A lithographic apparatus provided with a sensor, the sensor comprising:
- a frame which defines a space that is crossed multiple times by a wire;
- and
- detection electronics connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire, the detection electronics are connected to a source of infrared radiation, and are configured to switch off the source or block or divert infrared radiation generated by the source in response to the infrared radiation being detected by the sensor.
A lithographic method comprising:
- exposing a substrate using radiation generated by a radiation source;
- detecting presence of infrared radiation in a lithographic apparatus using a sensor comprising a frame which defines a space crossed multiple times by a wire and through which the radiation passes, wherein the detecting comprises detecting the infrared radiation via a change of temperature of the wire;
- and
- switching off, blocking or diverting the radiation from the radiation source in response to the infrared radiation being detected.
1 more element
Dependencies are inferred from the claim text.