Semiconductor device and manufacturing method of the semiconductor device

A method of manufacturing a semiconductor device, comprising:

• forming a device isolation groove on a semiconductor substrate to define a device region including a first part and a second part which are adjacent to each other by the device isolation groove;
• forming a hole at a contacting part between the first part and a second part of the device region;
• filling the device isolation groove and the hole with a first isolation film, to form a first isolation film region in the device isolation groove and a second isolation film region in the hole;
• forming a first gate electrode and a second gate electrode in a manner that the first gate electrode is formed in the first part and the second gate electrode is formed in the second part and the first gate electrode is formed on a first side of the second gate electrode and the second gate electrode is formed on a second side of the first gate electrode;
• forming a first side wall isolation film and a second side wall isolation film in a manner that the first side wall isolation film is formed on each of first and second sides of the first gate electrode, the second side being opposite to the first side, and a second side wall isolation film is formed on each of the first side and the second side of the second gate electrode;
• etching the semiconductor substrate by using the first gate electrode and the first side wall isolation film in the first part and the second gate electrode and the second side wall isolation film in the second part as masks, to form first, second, third, and fourth trenches in a manner that in the first part, the first trench is formed on the first side of the first gate electrode so that the first trench is contiguous to a part of the device isolation groove in the first side of the first gate electrode and a part of the first isolation film region is exposed, the second trench is formed on the second side of the first gate electrode so that the second trench is contiguous to a part of the hole in the second side of the first gate electrode and a part of the second isolation film region is exposed, and in the second part, the third trench is formed on the first side of the second gate electrode so that the third trench is disposed on the first side of the second gate electrode and is contiguous to a part of the hole so that a part of the second isolation film region is exposed, the fourth trench is formed on the second side of the second gate electrode so that the fourth trench is contiguous to a part of the device isolation groove in the second side of the second gate electrode and a part of the first isolation film region is exposed, and the second trench is contiguous to the third trench in a connecting part between the first part and the second part;
• filling lower parts of the first, the second, the third, and the fourth trenches with a first semiconductor layer having etching selectivity relative to the semiconductor substrate;
• forming a second semiconductor layer on the first semiconductor layer in the first, the second, the third, and the fourth trenches, the second semiconductor layer having etching selectivity relative to the first semiconductor layer, to fill the first, the second, the third, and the fourth trenches up to at least a surface of the semiconductor substrate;
• removing the first isolation film region through the device isolation groove and the second isolation film region through the hole, to expose the first semiconductor layer and the second semiconductor layer in the device isolation groove and the hole;
• selectively etching and removing the first semiconductor layer relative to the semiconductor substrate and the second semiconductor layer through the device isolation groove and the hole to form a void in a part where the first semiconductor layer had been formed in the first, the second, the third, and the fourth trenches;
• filling with the void with a third semiconductor layer in the first, the second, the third, and the fourth trenches, so that first, second, third, and fourth embedded isolation film regions are formed under the second semiconductor layers in the first, the second, the third, and the fourth trenches, respectively, a device isolation region is formed in the device isolation groove, and an isolation film region is formed in the hole;
• removing the first side wall isolation film and the second side wall isolation film;
• performing ion implantation by introducing an impurity element by using the first gate electrode in the first part an the second gate electrode in the second part as masks after the first side wall isolation film and the second side wall isolation film are removed, to form a source extension region and a drain extension region of a first transistor to be formed in the first part, the source extension region and the drain extension region being formed on the first side and the second side, respectively, of the first gate electrode, and a source extension region and a drain extension region of a second transistor to be formed in the second part, the source extension region and the drain extension region being formed on the first side and the second side, respectively, of the second gate electrode;
• forming a third side wall isolation film on each of the first and the second sides of the first gate electrode and a fourth side wall isolation film on each of the first and the second sides of the second gate electrode;
• and
• introducing an impurity element by using the first electrode, the second electrode, the third side wall isolation film, and the fourth side wall isolation film as masks to form a source region of the first transistor in the second semiconductor layer formed in the first trench, a drain region of the first transistor in the second semiconductor layer formed in the second trench, a source region of the second transistor in the second semiconductor layer formed in the third trench, and a drain region of the second transistor in the second semiconductor layer formed in the fourth trench.

A method of manufacturing a semiconductor device, comprising:

• forming a region to be a first active region of a first transistor and a region to be a second active region of a second transistor in a manner that the first active region is formed by using a first mask pattern, the first active region being included in a first part where the first transistor including a first gate electrode is to be formed, the first active region being included in a semiconductor substrate surface, and the second active region is formed by using a second mask pattern, the second active region being included in a second part where the second transistor including a second gate electrode is to be formed, the second active region being included in a semiconductor substrate surface, the first mask pattern being disposed on a first side of the second mask pattern, the second mask pattern being disposed on a second side of the first mask pattern;
• etching the semiconductor substrate using the first mask pattern and the second mask pattern as masks to form first, second, third, and fourth trenches in a manner that the first trench is formed on the first side of the first mask pattern, the second trench is formed on the second side of the first mask pattern, the second side being opposite to the first side of the first mask pattern, the third trench is formed on the first side of the second mask pattern, the fourth trench is formed on the second side of the second mask pattern, and the second trench is contiguous to the third trench;
• filling lower parts of the first, the second, the third, and the fourth trenches with a first semiconductor layer having etching selectivity relative to the semiconductor substrate;
• forming a second semiconductor layer on the first semiconductor layer in the first, the second, the third, and the fourth trenches, the second semiconductor layer having etching selectivity relative to the first semiconductor layer, to fill the first, the second, the third, and the fourth trenches at least up to a surface of the semiconductor substrate;
• forming a device isolation groove and a hole in the semiconductor substrate in a manner that the device isolation groove defines a device region including the first, the second, the third, and the fourth trenches, the hole is formed at a boundary between the first part where the first transistor is to be formed in the device region and the second part where the second transistor is to be formed in the device region, the second semiconductor layer formed in the first trench is exposed through the device isolation groove, the second semiconductor layer formed in the fourth trench is exposed through the device isolation groove, and the second semiconductor layer formed on the second trench and the second semiconductor layer formed in the third trench are disposed through the hole;
• selectively etching and removing the first semiconductor layer from the first and the fourth trenches through the device isolation groove and the first semiconductor layer from the second and the third trenches through the hole relative to the semiconductor substrate and the second semiconductor layer, to form a void in parts where the first semiconductor layer had been formed in the first, the second, the third, and the fourth trenches;
• filling the void in the first, the second the third, and the fourth trenches with a third isolation film through the device isolation groove and the hole, to form first, second, third, and fourth embedded isolation film region in a manner that the first, the second, the third, and the fourth embedded isolation film regions are formed under the second semiconductor layer in the first, the second, the third, and the fourth trenches, respectively;
• forming first and second gate electrodes in the first and the second active regions, respectively, via respective gate isolation films in a manner that the first gate electrode is formed on the first side of the second gate electrode and the second gate electrode is formed on the second side of the first gate electrode;
• performing ion implantation by introducing an impurity element by using the first gate electrode in the first active region and the second gate electrode in the second active region as masks, to form a source extension region and a drain extension region of the first transistor on the first side and the second side, respectively, of the first gate electrode in the first active region, and a source extension region and a drain extension region of the second transistor on the first side and the second side, respectively, of the second gate electrode in the second active region;
• forming first and second side wall isolation films in a manner that the first side wall isolation film is formed on each of the first and the second sides of the first gate electrode and the second side wall isolation film is formed on each of the first and the second sides of the second gate electrode;
• and
• introducing impurity element by using the first and the second gate electrodes and the first and the second side wall isolation films as masks, to form a source region of the first transistor in the second semiconductor layer in the first trench, a drain region of the first transistor in the second transistor layer in the second trench, a source region of the second transistor in the second semiconductor layer in the third trench, and a drain region of the second transistor in the second semiconductor layer in the fourth trench.