Pixel structure

A pixel structure, comprising:

• a substrate;
• a gate, disposed on the substrate;
• a patterned electrode, disposed on the substrate;
• a first insulating layer, disposed on the substrate, the gate and the patterned electrode, and the first insulating layer having a first through hole exposing a part of the patterned electrode;
• a common electrode, disposed on the first insulating layer and disposed corresponding to the patterned electrode;
• a second insulating layer, disposed on the common electrode and the first insulating layer, and the second insulating layer having a second through hole disposed corresponding to the first through hole;
• a semiconductor layer, disposed on the second insulating layer, and disposed corresponding to the gate;
• a source and a drain, disposed on the semiconductor layer and the second insulating layer and disposed corresponding to two sides of the gate respectively, the drain comprising a first portion and a second portion, the first portion of the drain being connected to the second portion of the drain, the first portion of the drain being electrically connected to the patterned electrode via the first through hole and the second through hole, and the second portion of the drain extending onto the common electrode, wherein the patterned electrode and the common electrode partially overlap and are coupled with each other to form a first storage capacitor, and the second portion of the drain and the common electrode partially overlap and are coupled with each other to form a second storage capacitor;
• a passivation layer, disposed on the second insulating layer, the semiconductor layer, the source and the drain, and the passivation layer having a third through hole exposing a part of the drain;
• and
• a pixel electrode, disposed on the passivation layer, and the pixel electrode being electrically connected to the drain via the third through hole.