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US 8,575,591 B2Granted
Apparatus for forming a nanoscale semiconductor structure on a substrate by applying a carrier fluid
AssigneeNokia Corporation
InventorsPetri Juhani Korpi, Risto Johannes Johannes Rönkkä
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Abstract
An apparatus applies a carrier fluid to a semiconductor substrate. The carrier fluid carries nanoparticles. The positions of a plurality of particles in the carrier fluid are manipulated by applying an electric field, removing the carrier fluid from the substrate so as to leave the nanoparticles on the substrate, and sintering the nanoparticles to form a region.
Claims8
An apparatus comprising:
- a carrier fluid delivery mechanism;
- an electric field source;
- an energy source;
- and
- a protective coating application mechanism that applies a protective coating to a plurality of nanoparticles;
- wherein the carrier fluid delivery mechanism applies a carrier fluid carrying the plurality of nanoparticles to a substrate, the electric field source manipulates the positions of the nanoparticles on the substrate by dielectrophoresis, and the energy source removes the carrier fluid from the substrate and the protective coating from the nanoparticles, so as to leave the nanoparticles on the substrate, and sinter the nanoparticles;
- and
- wherein the carrier fluid delivery mechanism comprises an inkjet printer.
5 more elements
Dependencies are inferred from the claim text.