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US 8,575,589 B2Granted
Nonvolatile semiconductor memory device and method of manufacturing the same
AssigneeKabushiki Kaisha Toshiba
InventorsHiroyuki Nagashima, Koichi Kubo, Hirofumi Inoue
Life of this patent
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Abstract
A nonvolatile semiconductor memory device includes a plurality of first lines; a plurality of second lines crossing the plurality of first lines; a plurality of memory cells each connected at an intersection of the first and second lines between both lines and including a variable resistor operative to store information in accordance with a variation in resistance; and a protection film covering the side of the variable resistor to suppress migration of cations at the side of the variable resistor.
Claims8
A nonvolatile semiconductor memory device, comprising:
- a plurality of first lines;
- a plurality of second lines crossing said plurality of first lines;
- a plurality of memory cells each connected at an intersection of said first and second lines between both lines and including a variable resistor operative to store information in accordance with a variation in resistance;
- a protection film being a multi-layered film covering a side surface of said variable resistor;
- and
- an interlayer-insulator film being buried between said memory cells arranged in a direction of extension of said first lines via said protection film,
- wherein said protection film directly contacts an entire planar surface, said planar surface comprising a first side surface of said variable resistor of a first memory cell of said memory cells;
- a second side surface of said variable resistor of a second memory cell of said memory cells, said second memory cell being adjacent to said first memory cell in said direction;
- and a third side surface of said interlayer-insulator film, and said first, second, and third side surfaces being on the same side in a direction of extension of said second lines.
6 more elements
Dependencies are inferred from the claim text.