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US 8,575,575 B2Granted
System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror
OwnerWilliam N. Partlo, Igor V. Fomenkovinventors
Life of this patent
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Abstract
A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.
Claims21
An extreme ultraviolet light chamber comprising:
- a collector mirror having a focus within an irradiation region;
- a cooling system coupled to a backside of the collector mirror operative to maintain a reflective surface of the collector mirror to less about 50 degrees C;
- a target material dispenser system containing a quantity of a tin containing target material;
- a buffer gas source coupled to the extreme ultraviolet light chamber;
- and
- a plurality of baffles located between the collector mirror and an output of the extreme ultraviolet light chamber, wherein at least a first portion of each one of the plurality of baffles is substantially aligned to the irradiation region and wherein at least a second portion of at least one of the plurality of baffles is substantially not aligned to the irradiation region.
3 more elements
An extreme ultraviolet light chamber comprising:
- a collector mirror;
- and
- a plurality of baffles located between the collector mirror and an output of the extreme ultraviolet light chamber wherein at least a first portion of each one of the plurality of baffles is substantially aligned to an irradiation region and wherein at least a second portion of at least one of the plurality of baffles is substantially not aligned to the irradiation region.
A method of generating an extreme ultraviolet light comprising:
- outputting a plurality of droplets of a tin containing target material from a droplet generator in an extreme ultraviolet laser chamber;
- focusing a source laser on a selected one of the plurality of droplets in an irradiation region;
- irradiating the selected one of the plurality of droplets in an irradiation region;
- collecting an extreme ultraviolet light emitted from the irradiated droplet in a collector mirror having a focus within the irradiation region;
- maintaining a reflective surface of the collector mirror to less about 50 degrees C;
- depositing a first quantity of a target material residue on the reflective surface of the collector mirror, the target material residue being emitted from the irradiated droplet;
- injecting a hydrogen containing gas into the extreme ultraviolet laser chamber;
- converting a first portion of the first quantity of target material residue on the reflective surface of the collector mirror to a hydride;
- and
- evaporating the hydride of the first portion of the first quantity of target material residue from the reflective surface of the collector mirror;
- removing the evaporated hydride of the first portion of the first quantity of target material residue from the extreme ultraviolet laser chamber;
- and
- the extreme ultraviolet laser chamber including a plurality of baffles located between the collector mirror and an output of the extreme ultraviolet laser chamber, wherein at least a first portion of each one of the plurality of baffles is substantially aligned to the irradiation region and wherein at least a second portion of at least one of the plurality of baffles is substantially not aligned to the irradiation region.
10 more elements
A method of generating an extreme ultraviolet light comprising:
- outputting a plurality of droplets of a tin containing target material from a droplet generator in an extreme ultraviolet laser chamber;
- focusing a source laser on a selected one of the plurality of droplets in an irradiation region;
- irradiating the selected one of the plurality of droplets in an irradiation region;
- collecting an extreme ultraviolet light emitted from the irradiated droplet in a collector mirror;
- maintaining the collector mirror at less than about 50 degrees C, collector mirror having a focus within the irradiation region;
- and
- collecting a quantity of target material residue on a plurality of baffles located between the collector mirror and an output of the extreme ultraviolet laser chamber each of the plurality of baffles being in contact with an inner surface of the extreme ultraviolet light chamber, wherein at least a first portion of each one of the plurality of baffles is substantially aligned to the irradiation region and wherein at least a second portion of at least one of the plurality of baffles is substantially not aligned to the irradiation region.
4 more elements
Dependencies are inferred from the claim text.