Ion source apparatus and methods of using the same
AssigneeGuardian Industries Corp.
InventorMaximo Frati
Life of this patent
Estimating the term…
Abstract
An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.
Claims23
An ion beam source that is configured to emit an ion beam in a direction of a substrate, the ion beam source comprising:
- a cathode that includes a discharge opening defined therein, the discharge opening having a predetermined width;
- an anode located spaced apart from the cathode by a predetermined depth, the direction in which the ion beam is to be emitted being substantially parallel to a direction from the anode to the discharge opening in the cathode;
- first and second ceramic walls that are located between the anode and the cathode and at least partially define a discharge channel between the anode and the cathode;
- and
- at least one magnet that is shaped, arranged, and located in the ion beam source to generate a magnetic field that increases in density in general accordance with a gradient distribution with a low proximate the anode to a high at or proximate the discharge opening, and with magnetic field lines that run substantially perpendicular to an emmission trajectory of emitted ions within the discharge channel.
A method of ion depositing a layer on a substrate in connection with an ion source that includes at least one cathode, an anode located proximate to an aperture defined in the cathode, the aperture having a predetermined width and a predetermined depth that separates the anode from the aperture, at least one magnet for generating a magnetic field, and first and second ceramic barrier walls provided within the ion source and at least partially defining a passage between the anode and the aperture in the cathode, the method comprising:
- providing power to the at least one magnet to generate the magnetic field, the at least one magnet being shaped, arranged, and located in the ion source such that the generated magnetic field increases in density with a low proximate the anode to a high at or proximate the aperture;
- controlling the maximum density such that the ion source discharge current at or proximate the aperture is sufficiently low for selected gas- and current-related operating conditions, and
- providing at least one gas to an area proximate to the aperture defined in the cathode, the provided gas being ionized and emitted towards the substrate.
Dependencies are inferred from the claim text.