Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers

A sacrificial polymer composition comprising:

• a polycarbonate polymer comprising repeating units derived from at least one polycyclic 2,3-diol monomer of Formulae A1:
• where, R4 is hydrogen or phenyl;
• and
• an acid generator selected from a photoacid generator, which is tris[4-[(4-acetylphenyl)thio]phenyl]sulfonium tris((trifluoromethyl)sulfonyl)methanide.

A sacrificial polymer composition comprising:

• a polycarbonate polymer comprising repeating units derived from at least one polycyclic 2,3-diol monomer of Formulae B1:
• where, R4 is hydrogen or phenyl;
• and
• an acid generator selected from a photoacid generator, which is tris[4-[(4-acetylphenyl)thio]phenyl]sulfonium
• tris((trifluoromethyl)sulfonyl)methanide.

A sacrificial polymer composition comprising:

• a polycarbonate polymer comprising repeating units derived from at least one polycyclic 2,3-diol monomer of Formulae C1:
• where, R4 is hydrogen or phenyl;
• and
• an acid generator selected from a photoacid generator, which is s[4-[(4-acetylphenyl)thio]phenyl]sulfonium
• tris((trifluoromethyl)sulfonyl)methanide.