Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1),
• wherein in the formula,
• each of R11 and R12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group;
• n1 represents 0 or 1;
• X11 represents an oxygen atom or a sulfur atom when n1 is 0, and represents a nitrogen atom when n1 is 1;
• M11 represents a single bond, an alkylene group, a cycloalkylene group, —S—, —O—, —CO—, —CS—, —SO2—, —N(R0)—, or a combination of two or more kinds of the same, herein, R0 represents a hydrogen atom or an alkyl group;
• each of M12 and M13 independently represents a single bond or a divalent linking group;
• Q11 represents an alkyl group, an aralkyl group, a cycloalkyl group, or an aryl group when M11 is a group other than a single bond, and represents an alkyl group, an aralkyl group, or a cycloalkyl group when M11 is a single bond;
• Q12 represents an organic group;
• Q13 represents an organic group or a hydrogen atom;
• and
• at least two of R11, R12, Q12, and Q13 may form a ring by binding to each other.