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US 8,574,812 B2Granted
Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Satoshi Yamaguchi
Life of this patent
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Abstract
A resist composition of the invention includes: (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator represented by the formula (II), wherein R1, A1, R2, Q1, Q2, L1, ring W1, and Z+ are defined in the specification.
Claims7
A resist composition comprising
- (A1) a resin having a structural unit represented by the formula (I),
- (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and
- (B) an acid generator represented by the formula (II),
- wherein R1 represents a hydrogen atom or a methyl group;
- A1 represents a C1 to C6 alkanediyl group;
- R2 represents a C1 to C10 hydrocarbon group having a fluorine atom
- wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- L1 represents *—CO—O-La- or *—CH2—O-Lb-, * represents a bond to —CQ1Q2, La and Lb independently represent a C1 to C15 divalent saturated hydrocarbon group, and one or more —CH2— contained in the divalent hydrocarbon group may be replaced by —O— or —CO—;
- ring W1 represents a C2 to C36 heterocyclic ring;
- Z+ represents an organic cation.
7 more elements
Dependencies are inferred from the claim text.