Magnetic structure including two ferromagnetically coupled magnetic layers and method of manufacturing same

A magnetic structure comprising:

• a first magnetic layer having a top surface;
• a nonmagnetic insulating layer having a top surface, the nonmagnetic insulating layer being disposed to cover a portion of the top surface of the first magnetic layer;
• a nonmagnetic adhesion layer disposed on the top surfaces of the first magnetic layer and the nonmagnetic insulating layer;
• and
• a second magnetic layer disposed on the nonmagnetic adhesion layer, the second magnetic layer being in direct contact with the nonmagnetic adhesion layer, wherein:
• the nonmagnetic insulating layer contains an oxygen atom;
• the nonmagnetic adhesion layer is composed of one element or a plurality of elements selected from the group consisting of Al, Si and nonmagnetic transition metal elements except Ru, and a bond enthalpy of a diatomic molecule composed of an atom of the one element or each of the plurality of elements and an oxygen atom is 400 kJ/mol or higher;
• the nonmagnetic adhesion layer has a thickness within a range of 0.3 to 0.8 nm;
• and
• the first magnetic layer and the second magnetic layer are ferromagnetically coupled to each other.

A method of manufacturing a magnetic structure, the magnetic structure comprising:

• a first magnetic layer having a top surface;
• a nonmagnetic insulating layer having a top surface, the nonmagnetic insulating layer being adjacent to the first magnetic layer without overlapping the top surface of the first magnetic layer;
• a nonmagnetic adhesion layer disposed on the top surfaces of the first magnetic layer and the nonmagnetic insulating layer;
• and a second magnetic layer disposed on the nonmagnetic adhesion layer,
• the method comprising the steps of:
• forming the first magnetic layer and the nonmagnetic insulating layer;
• forming the nonmagnetic adhesion layer on the top surfaces of the first magnetic layer and the nonmagnetic insulating layer;
• and
• forming the second magnetic layer on the nonmagnetic adhesion layer, the second magnetic layer being in direct contact with the nonmagnetic adhesion layer, wherein:
• the nonmagnetic insulating layer contains an oxygen atom;
• the nonmagnetic adhesion layer is composed of one element or a plurality of elements selected from the group consisting of Al, Si and nonmagnetic transition metal elements except Ru, and a bond enthalpy of a diatomic molecule composed of an atom of the one element or each of the plurality of elements and an oxygen atom is 400 kJ/mol or higher;
• the nonmagnetic adhesion layer has a thickness within a range of 0.3 to 0.8 nm;
• and
• the first magnetic layer and the second magnetic layer are ferromagnetically coupled to each other.

A method of manufacturing a magnetic structure, the magnetic structure comprising:

• a first magnetic layer having a top surface;
• a nonmagnetic insulating layer having a top surface, the nonmagnetic insulating layer being disposed to cover a portion of the top surface of the first magnetic layer;
• a nonmagnetic adhesion layer disposed on the top surfaces of the first magnetic layer and the nonmagnetic insulating layer;
• and a second magnetic layer disposed on the nonmagnetic adhesion layer,
• the method comprising the steps of:
• forming the first magnetic layer;
• forming the nonmagnetic insulating layer;
• forming the nonmagnetic adhesion layer on the top surfaces of the first magnetic layer and the nonmagnetic insulating layer;
• and
• forming the second magnetic layer on the nonmagnetic adhesion layer, the second magnetic layer being in direct contact with the nonmagnetic adhesion layer, wherein:
• the nonmagnetic insulating layer contains an oxygen atom;
• the nonmagnetic adhesion layer is composed of one element or a plurality of elements selected from the group consisting of Al, Si and nonmagnetic transition metal elements except Ru, and a bond enthalpy of a diatomic molecule composed of an atom of the one element or each of the plurality of elements and an oxygen atom is 400 kJ/mol or higher;
• the nonmagnetic adhesion layer has a thickness within a range of 0.3 to 0.8 nm;
• and
• the first magnetic layer and the second magnetic layer are ferromagnetically coupled to each other.