Gas stream purification apparatus and method
AssigneeLinde Aktiengesellschaft
InventorsNaresh J. Suchak, Steven Finley
Life of this patent
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Abstract
An apparatus and method for removing contaminants from a gas stream is provided which includes (a) introducing the gas stream into a reaction chamber of a scrubber; (b) oxidizing first contaminants in a liquid phase with a reactive species in a sump of the scrubber for providing an oxidizing solution; (c) oxidizing second contaminants in a gas phase of the gas stream above the sump with excess reactive species disengaging from the oxidizing solution in the sump; (d) oxidizing and scrubbing third contaminants in a gas-liquid contact assembly disposed above the gas stream.
Claims8
A method for removing contaminants from a gas stream, comprising;
- (a) introducing the gas stream into a reaction chamber of a scrubber;
- (b) introducing reactive species in a liquid phase into a sump of the scrubber and oxidizing first contaminants in said liquid phase;
- (c) providing an oxidizing solution from said oxidizing in (b);
- (d) oxidizing second contaminants in a gas phase of the gas stream above the sump with excess reactive species disengaging from the oxidizing solution in the sump;
- (e) oxidizing and scrubbing third contaminants in a gas-liquid contact assembly disposed above the gas stream;
- wherein (b)-(e) occur simultaneously.
Dependencies are inferred from the claim text.