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US 8,574,505 B2Granted
Reactor and plant for the continuous preparation of high-purity silicon tetrachloride or high-purity germanium tetrachloride
AssigneeEvonik Degussa GmbH
InventorsJuergen Erwin Lang, Rainer Nicolai, Hartwig Rauleder
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Abstract
A reactor and a plant containing the reactor for conducting a continuous, industrial process for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride is provided. The plant contains a plasma reactor having a dielectric, a high voltage electrode and an earthed, metallic heat exchanger, in which the longitudinal axes of the dielectric, of the high-voltage electrode and of the earthed, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.
Claims16
A plasma reactor, comprising:
- a reactor housing,
- a high-voltage supply, and
- at least one micro unit for the plasma treatment which consists essentially of a grounded, metallic heat exchanger, a dielectric, a perforated plate, a grid or a mesh and a high-voltage electrode;
- wherein longitudinal axes of the dielectric, of the high-voltage electrode and of the grounded, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the direction vector of the force of gravity,
- the dielectric is located between the metallic heat exchanger and the high-voltage electrode,
- a feed for a phase to be treated in the reactor is located at an earth end of the reactor such that the feed to be treated passes through the perforated plate and enters a space between the metallic heat exchanger and the high-voltage electrode from the earth end, and
- the dielectric is mechanically self-stabilized.
4 more elements
Dependencies are inferred from the claim text.