Method of manufacturing thin film device

A method of manufacturing a thin film device, the method comprising:

• preparing a substrate on which a sacrificial layer and a thin film are sequentially formed;
• temporarily bonding the thin film to a circumferential surface of a transfer roll that is rolling and simultaneously removing the sacrificial layer to separate the thin film from the substrate, wherein the thin film is temporarily bonded to the transfer roll at a first position of the transfer roll, and wherein the sacrificial layer is removed by irradiating a laser beam onto the sacrificial layer through the substrate;
• and
• bonding the thin film to a sheet with the transfer roll, wherein the thin film is bonded to the sheet at a second position of the transfer roll, wherein the thin film is bonded to the sheet by running the sheet so that a surface of the sheet is bonded to the separated surface of the thin film, and wherein the first position of the transfer roll and the second position of the transfer roll are located at different positions along the circumferential surface of the transfer roll;
• wherein the transfer roll comprises a singular roller and the first position and the second position of the transfer roll are located along a circumferential surface of the singular roller;
• wherein the preparing of the substrate further comprises patterning the thin film to form a thin film pattern to be bonded comprising a functional portion pattern performing a particular function and a support portion pattern connected to the functional portion pattern which has a larger area than the functional portion pattern;
• wherein after bonding of the patterned thin film a step of removing the support portion pattern from the functional portion pattern is conducted.