Improvements for rapid prototyping apparatus

A stereolithography apparatus (SA) with an exposure system (ES), said exposure system comprising:

• at least one printed circuit board (PCB) with at least one socket (SO) and at least one light emitting diode (LD),
• at least two spatial light modulators (SLM) with a plurality of individually controllable light-modulators,
• input optics (IO) optically coupled to said spatial light modulators (SLM), output optics (OO) optically coupled to said spatial light modulators (SLM), at least one control unit (CU),
• at least one light source bed (LSB) releasable locking said printed circuit board (PCB) in such a way that the optical axis of the light emitting diode (OALD) is aligned with the optical axis of said input optics (OAOP),
• wherein said input optics (IO) and output optics (OO) facilitates transmission of light emitted from said light emitting diodes (LD) via said individually controllable light modulators (LM) of said spatial light modulators (SLM) to an illumination area (IA),
• wherein said spatial light modulators (SLM) enable an establishment of a pattern of the light from said input optics (IO), according to control signals from said control unit (CU),
• wherein said output optics (OO) enables focusing of the pattern of light from said spatial light modulators (SLM) onto an illumination area (IA),
• wherein said light source bed (LSB), said exposure system (ES) or said printed circuit board (PCB) comprise an adjusting mechanism for adjusting the position of the optical axis of said at least one light emitting diode (OALD) or of the optical axis of said input optics (OAOP) after locking the printed circuit board PCB onto/into the light source bed LSB.