Arrangement for reflection of heat radiation, process of making same and uses of same
AssigneeSchott AG
InventorsChristian Henn, Wolfgang Schmidbauer, Torsten Gabelmann
Life of this patent
Estimating the term…
Abstract
The heat reflecting arrangement with an improved high heat resistance, e.g. 100 hours at 500° C., includes a substrate, a heat reflecting layer (A) on at least one side of the substrate, which contains indium tin oxide (ITO), and a barrier layer (B) that covers the heat reflecting layer (A), which contains a metal oxide and/or a metal nitride. A fireplace or baking oven with a viewing window having this layer system with the heat reflecting layer is also described. In addition a process for providing the heat reflecting arrangement is described.
Claims20
A heat reflecting arrangement that maintains a high reflectivity at thermal loads of 500° C. for more than 100 hours, said heat reflecting arrangement comprising
- a transparent glass or glass ceramic substrate;
- a heat reflecting layer (A) on at least one side of the substrate, said heat reflecting layer comprising at least 30% indium tin oxide (ITO) and having a thickness of 100 to 800 nm;
- and
- a barrier layer (B) that covers the heat reflecting layer (A), wherein said barrier layer (B) consists of at least one compound and said at least one compound is selected from the group consisting of SiO2, Si3N4, Al2O3, TiO2, SiOxNy, ZrO2, MoO2 and Nb2O5;
- wherein said barrier layer (B) has a thickness selected according a refractive index thereof, so that said heat reflecting layer (A) and said barrier layer (B) cooperate as reflector and interference system with a plasma edge from 1200 nm to 1600 nm, so that the arrangement is completely transparent in a visible range but reflects infrared radiation in an infrared range.
A heat reflecting arrangement that maintains a high reflectivity at thermal loads of 500° C. for more than 100 hours, said heat reflecting arrangement comprising
- a transparent glass or glass ceramic substrate;
- a heat reflecting layer (A) on at least one side of the substrate, said heat reflecting layer comprising at least 30% indium tin oxide (ITO) and having a thickness of 100 to 800 nm;
- and
- a barrier layer (B) that covers the heat reflecting layer (A), wherein said barrier layer (B) consists of at least one compound and said at least one compound is selected from the group consisting of SiO2, Si3N4, Al2O3, TiO2, SiOxNy, ZrO2, MoO2 and Nb2O5;
- a separating layer (C) arranged between said glass or glass ceramic substrate and said heat reflecting layer, wherein said separating layer (C) consists of silicon dioxide, silicon nitride or aluminum oxide;
- wherein said barrier layer (B) has a thickness selected according a refractive index thereof, so that said heat reflecting layer (A) and said barrier layer (B) cooperate as reflector and interference system with a plasma edge from 1200 nm to 1600 nm, so that the arrangement is completely transparent in a visible range but reflects infrared radiation in an infrared range.
A process for making a heat reflecting arrangement, wherein said heat reflecting arrangement comprises a transparent glass or glass ceramic substrate;
- a heat reflecting layer (A) on at least one side of the substrate, said heat reflecting layer comprising at least 30% indium tin oxide (ITO) and having a thickness of 100 to 800 nm;
- and a barrier layer (B) that covers the heat reflecting layer (A), wherein said barrier layer (B) consists of at least one compound and said at least one compound is selected from the group consisting of SiO2, Si3N4, Al2O3, TiO2, SiOxNy, ZrO2, MoO2 and Nb2O5;
- wherein said barrier layer has a thickness selected according a refractive index thereof, so that said heat reflecting layer (A) and said barrier layer (B) cooperate as reflector and interference system with a plasma edge from 1200 nm to 1600 nm, so that the arrangement is completely transparent in a visible range but reflects infrared radiation in an infrared range, said process comprising the steps of:
- a) applying said heat reflecting layer (A) on said glass or glass ceramic substrate by means of a sputtering process;
- and
- b) after applying the heat reflecting layer (A), applying the barrier layer (B) over the heat reflecting layer.
A fireplace comprising a heat reflecting arrangement maintains a high reflectivity at thermal loads of 500° C. for more than 100 hours, said heat reflecting arrangement comprising
- a transparent glass or glass ceramic substrate;
- a heat reflecting layer (A) on at least one side of the substrate, said heat reflecting layer comprising at least 30% indium tin oxide (ITO) and having a thickness of 100 to 800 nm;
- and
- a barrier layer (B) that covers the heat reflecting layer (A), wherein said barrier layer (B) consists of at least one compound and said at least one compound is selected from the group consisting of SiO2, Si3N4, Al2O3, TiO2, SiOxNy, ZrO2, MoO2 and Nb2O5;
- wherein said barrier layer has a thickness selected according a refractive index thereof, so that said heat reflecting layer (A) and said barrier layer (B) cooperate as reflector and interference system with a plasma edge from 1200 nm to 1300 nm, so that the arrangement is completely transparent in a visible range but reflects infrared radiation in an infrared range.
A baking oven comprising a heat reflecting arrangement that maintains a high reflectivity at thermal loads of 500° C. for more than 100 hours, said heat reflecting arrangement comprising
- a transparent glass or glass ceramic substrate;
- a heat reflecting layer (A) on at least one side of the substrate, said heat reflecting layer comprising at least 30% indium tin oxide (ITO) and having a thickness of 100 to 800 nm;
- and
- a barrier layer (B) that covers the heat reflecting layer (A), wherein said barrier layer (B) consists of at least one compound and said at least one compound is selected from the group consisting of SiO2, Si3N4, Al2O3, TiO2, SiOxNy, ZrO2, MoO2 and Nb2O5;
- wherein said barrier layer has a thickness selected according a refractive index thereof, so that said heat reflecting layer (A) and said barrier layer (B) cooperate as reflector and interference system with a plasma edge from 1200 nm to 1300 nm, so that the arrangement is completely transparent in a visible range but reflects infrared radiation in an infrared range.
Dependencies are inferred from the claim text.