Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
AssigneeLam Research Corporation
InventorsAndreas Fischer, William S. Kennedy, Peter Loewenhardt, David Trussell
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Abstract
An improved upper electrode system has a multi-part electrode in which a central portion of the electrode having high wear is replaceable independent of an outer peripheral portion of the electrode. The upper electrode can be used in plasma processing systems for processing semiconductor substrates, such as by etching or CVD. The multi-part upper electrode system is particularly useful for large size wafer processing chambers, such as 300 mm wafer processing chambers for which monolithic electrodes are unavailable or costly.
Claims14
A replaceable electrode for a plasma reaction chamber wherein the replaceable electrode forms part of an upper electrode of the plasma reaction chamber, comprising:
- a ring shaped backing plate;
- a plurality of electrode segments forming a ring shaped electrode;
- an electrically conductive elastomer securing the plurality of electrode segments to the ring shaped backing plate;
- and
- wherein the plurality of electrode segments form a ring having an inner edge and a plasma-exposed angled surface extending outwardly from the inner edge and wherein the ring shaped backing plate comprises bores for securing the electrode to a top plate in the plasma reaction chamber.
Dependencies are inferred from the claim text.