Partition response surface modeling
AssigneeMentor Graphics Corporation
InventorsMarko P Chew, Yue Yang, Toshikazu Endo
Life of this patent
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Abstract
A group of models are developed to predict printed contour deviations relative to the corresponding layout edges for different classes of layout topologies. A plurality of calibration layouts with topologies belonging to a class of layout topologies are used to generate a model for the class of layout topologies. A standard least square regression is modified for model creation. The model error may be monitored dynamically.
Claims28
A method, comprising:
- by a computing device:
- receiving layout data for a plurality of calibration layouts, each of the plurality of calibration layouts having a layout topology belonging to a class of layout topologies;
- deriving density information for the plurality of calibration layouts based on the layout data;
- receiving printed contour information for the plurality of calibration layouts;
- deriving contour deviation information for the plurality of calibration layouts based on the printed contour information;
- and
- generating a model for predicting printed contour deviations for the class of layout topologies based on the density information and the contour deviation information, wherein the model is generated using a response surface methodology.
A processor-readable storage device storing processor-executable instructions for causing one or more processors to perform a method, the method comprising:
- receiving layout data for a plurality of calibration layouts, each of the plurality of calibration layouts having a layout topology belonging to a class of layout topologies;
- deriving density information for the plurality of calibration layouts based on the layout data;
- receiving printed contour information for the plurality of calibration layouts;
- deriving contour deviation information for the plurality of calibration layouts based on the printed contour information;
- and
- generating a model for predicting printed contour deviations for the class of layout topologies based on the density information and the contour deviation information, wherein the model is generated using a response surface methodology.
Dependencies are inferred from the claim text.