# US 8,571,362 B1 · Forming optical device using multiple mask formation techniques > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,571,362 B1 - Document ID: US8571362B1 - Status: Granted - Kind: B1 - Application number: 12/384,094 - Filed: 2009-03-30 - Granted: 2013-10-29 - Earliest claimed: 2009-03-30 - Assignees: Mellanox Technologies, Ltd. - Applicants: Po Dong - Inventors: Po Dong - Web page: https://patentgrep.com/patent/US8571362B1 ## CPC - G02B 6/136: by etching - G02B 6/12004: {Combinations of two or more optical elements} - G02B 6/12007: {forming wavelength selective elements, e.g. multiplexer, demultiplexer} - G02B 2006/12173: {Masking} - G02B 2006/12176: {Etching} - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS ## Abstract An optical device includes a first region interfaced with a second region. The first region includes one or more surfaces that are formed using electron-beam lithography and the second region includes one or more surfaces that are formed using photolithography. A component crosses the interface and includes a first portion located in the first region and a second portion located in the second region. The component includes a light-signal carrying region that constrains light signals. The first portion includes a first taper that expands the light-signal carrying region as the component approaches the interface and the second portion includes a second taper that expands the light-signal carrying region as the component approaches the interface. ## Claims ### Claim 1 An optical device, comprising: a waveguide on a base, the waveguide having an interface between a first portion and a second portion, the first portion of the waveguide having one or more surfaces that each has features in accordance with a surface formed using a mask generated by electron-beam lithography, the second portion of the waveguide having one or more surfaces that each has features in accordance with a surface formed using a mask generated by photolithography, the first portion of the waveguide having a first taper that expands one or more dimensions of the waveguide as the first portion of the waveguide approaches the interface, and the second portion of the waveguide having a second taper that expands one or more dimensions of the waveguide as the second portion of the waveguide approaches the interface. ### Claim 2 (depends on 1) The device of claim 1, wherein an unbranched portion of the waveguide connects the first taper to the second taper. ### Claim 3 (depends on 1) The device of claim 1, wherein the first taper and the second taper each include a horizontal taper. ### Claim 4 (depends on 1) The device of claim 1, wherein the first taper contacts the second taper. ### Claim 5 (depends on 1) The device of claim 1, wherein the first taper is located entirely in the first region and the second taper is located entirely in the second region. ### Claim 6 (depends on 1) The device of claim 1, wherein the waveguide is configured to guide a light signal through a light-transmitting medium, a portion of the light-transmitting medium extending continuously from within the first portion of the waveguide, through the interface, and then into the second portion of the waveguide. ### Claim 7 (depends on 1) The device of claim 1, wherein the waveguide is configured to guide a light signal through a light-transmitting medium, the light-transmitting medium included in the first portion of the waveguide being the same as the same as the light-transmitting medium included in the second portion of the waveguide. ### Claim 8 (depends on 1) The device of claim 1, wherein the one or more surfaces of the first portion of the waveguide are smoother than the one or more surfaces of the second portion of the waveguide. ### Claim 9 A method of forming an optical device, comprising: etching a device so as to define a waveguide on a base, the waveguide having an interface between a first portion and a second portion, the first portion of the waveguide having one or more surfaces defined by an electron-beam lithography mask, the second portion of the waveguide having one or more surfaces defined by a second mask generated by photolithography, the first portion of the waveguide having a first taper that expands one or more dimensions of the waveguide as the first portion of the waveguide approaches the interface, and the second portion of the waveguide having a second taper that expands one or more dimensions of the waveguide as the second portion of the waveguide approaches the interface. ### Claim 10 (depends on 9) The method of claim 9, wherein the first mask and the second mask are both in place on the device during the etch. ### Claim 11 (depends on 9) The method of claim 9, wherein etching the device includes etching the first portion of the waveguide concurrently with the second portion of the waveguide. ### Claim 12 (depends on 9) The method of claim 9, wherein etching the device includes etching the first portion of the waveguide and the second portion of the waveguide sequentially. ### Claim 13 (depends on 9) The method of claim 9, wherein the waveguide is configured to guide a light signal through a light-transmitting medium, the light-transmitting medium extending from the first portion of the waveguide, through the interface, and then into the second portion of the waveguide. ### Claim 14 (depends on 9) The method of claim 9, wherein the waveguide is configured to guide a light signal through a light-transmitting medium, the light-transmitting medium included in the first portion of the waveguide being the same as the same as the light-transmitting medium included in the second portion of the waveguide. ### Claim 15 (depends on 14) The method of claim 14, wherein the light-transmitting medium is elemental silicon. ### Claim 16 (depends on 9) The method of claim 9, wherein the one or more surfaces of the first portion of the waveguide are smoother than the one or more surfaces of the second portion of the waveguide. ### Claim 17 (depends on 9) The method of claim 9, further comprising: employing electron-beam lithography to form the electron-beam lithography mask; and employing photolithography to from the second mask.