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US 8,570,655 B2Granted
Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination
AssigneeRamot at Tel-Aviv University Ltd.
InventorsEyal Ben-Eliezer, Emanuel Marom, Naim Konforti, Zeev Zalevsky
Life of this patent
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Abstract
A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter ψ; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.
Claims18
A method of optical element manufacturing, the method comprising:
- selecting a range of a misfocus parameter Ψ that spans between misfocus parameter Ψ values of at least +12 and −12;
- and designing the optical element to comprise multiple regions, wherein an optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter Ψ, transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.
Dependencies are inferred from the claim text.