# US 8,570,489 B2 · Lithographic projection apparatus and method of compensating perturbation factors > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,570,489 B2 - Document ID: US8570489B2 - Status: Granted - Kind: B2 - Application number: 12/741,960 - Filed: 2008-11-07 - Published: 2010-12-23 - Granted: 2013-10-29 - Earliest claimed: 2007-11-08 - Assignees: ASML Netherlands B.V. - Applicants: Jan Bernard Plechelmus Van Schoot; Antonius Johannes Josephus Van Dijsseldonk; Hans Van Der Laan; Diederik Jan Maas - Inventors: Jan Bernard Plechelmus Van Schoot; Antonius Johannes Josephus Van Dijsseldonk; Hans Van Der Laan; Diederik Jan Maas - Web page: https://patentgrep.com/patent/US8570489B2 ## CPC - G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices} - G03F 7/70208: {Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems} - G03F 7/70941: {Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus. ## Claims ### Claim 1 A lithographic projection apparatus comprising: a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors, the system comprising an additional exposure system configured to provide an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of a different lithographic apparatus. ### Claim 2 (depends on 1) The lithographic projection apparatus according to claim 1, wherein the system is configured to compensate one or more perturbation factors by moving an element within the lithographic projection apparatus to cause out-of- focus projection of the patterned additional beam on the target portion of the substrate. ### Claim 3 (depends on 2) The lithographic projection apparatus according to claim 2, wherein the element which is to be moved by the system comprises the substrate holder. ### Claim 4 (depends on 2) The lithographic projection apparatus according to claim 2, wherein the element which is to be moved by the system comprises an optical element in the projection system. ### Claim 5 (depends on 1) The lithographic projection apparatus according to claim 1, wherein the system configured to compensate one or more perturbation factors comprises a further optical element configured to be moved from and to a location between the projection system and the substrate holder, the further optical element being substantially transmissive for a first type of radiation and substantially non-transmissive for a second type of radiation. ### Claim 6 (depends on 5) The lithographic projection apparatus according to claim 5, wherein the first type of radiation has a wavelength between 100 nm and 300 nm, and the second type of radiation has a wavelength between 5 nm and 50 nm. ### Claim 7 (depends on 1) The lithographic projection apparatus according to claim 1, wherein the additional beam of radiation is a beam of extreme ultraviolet radiation. ### Claim 8 (depends on 1) The lithographic projection apparatus according to claim 1, wherein the additional exposure system comprises a programmable radiation modulation array and a control unit, the control unit configured to control the programmable radiation modulation array based on the pattern of the patterning device and on the lithographic projection apparatus property data. ### Claim 9 (depends on 8) The lithographic projection apparatus according to claim 8, wherein the control unit comprises: an input configured to receive pattern data based on the pattern of the patterning device; a further input configured to receive lithographic projection apparatus property data; a processor configured to calculate radiation modulation data on the basis of the pattern data and the lithographic projection apparatus property data; and an output configured to provide the radiation modulation data to the programmable radiation modulation array. ### Claim 10 (depends on 9) The lithographic projection apparatus according to claim 9, wherein the further input is further configured to receive resist property data, the resist property data characterizing resist provided on the target portion of the substrate, and the processor is configured to calculate the radiation modulation data on the basis of the pattern data, the lithographic projection apparatus property data and the resist property data. ### Claim 11 (depends on 10) The lithographic projection apparatus according to claim 10, wherein the resist property data comprises at least one resist property selected from a group consisting of contrast, sensitivity, and spectral response on actinic wavelength. ### Claim 12 (depends on 1) The lithographic projection apparatus according to claim 1, wherein the additional exposure system further comprises a zoom-condensor lens configured to adjust a magnification of the patterned additional beam of radiation. ### Claim 13 (depends on 1) The lithographic projection apparatus according to claim 1, wherein the lithographic projection apparatus property data relate to at least one property of the lithographic projection apparatus selected from a group consisting of stray radiation profile and source power spectrum. ### Claim 14 (depends on 1) A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate using the lithographic projection apparatus as defined by claim 1. ### Claim 15 (depends on 14) A non-transitory computer readable medium comprising computer executable code, which, when loaded on a computer assembly, enables the computer assembly to control the device manufacturing method according to claim 14. ### Claim 16 A method of compensating perturbation factors in a lithographic projection apparatus, the method comprising: conditioning a beam of radiation; imparting the beam of radiation with a pattern in its cross-section by using a patterning device so as to form a patterned beam of radiation; projecting the beam of radiation onto a target portion of a substrate; deriving an additional pattern based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of a different lithographic apparatus; conditioning an additional beam of radiation provided by an additional exposure system; imparting the additional beam of radiation with the additional pattern in its cross-section so as to form an additional patterned beam of radiation; and projecting the additional patterned beam of radiation onto the target portion of the substrate. ### Claim 17 (depends on 16) The method according to claim 16, wherein the deriving an additional pattern is further based on resist property data, the resist property data characterizing resist provided on the target portion of the substrate. ### Claim 18 (depends on 17) The method according to claim 17, wherein the resist property data comprises at least one resist property selected from a group consisting of contrast, sensitivity, and spectral response on actinic wavelength. ### Claim 19 (depends on 16) The method according to claim 16, wherein deriving an additional pattern includes: receiving pattern data; receiving the lithographic projection apparatus property data; calculating radiation modulation data on the basis of the pattern data and the lithographic projection apparatus property data, the radiation modulation data being suitable to form the additional pattern. ### Claim 20 (depends on 19) The method according to claim 19, wherein the calculating radiation modulation data includes: performing a Fourier transform on the pattern data to form transform data; passing the transform data through a low-pass filter so as to form low-pass transform data; providing lithographic projection apparatus property data in the form of a stray radiation profile and/or a source power spectrum; calculating further low-pass transform data based on the low-pass transform data and the respective stray radiation profile and/or the source power spectrum; and performing an inverse Fourier transform on the low-pass transform data and the further low-pass transform data to form the radiation modulation data. ### Claim 21 (depends on 19) The method according to claim 19, wherein pattern data is Graphic Data System II data. ### Claim 22 (depends on 16) The method according to claim 16, wherein the projecting of the additional beam of radiation is performed out of focus by moving an element within the lithographic projection apparatus. ### Claim 23 (depends on 16) The method according to claim 16, wherein the deriving an additional pattern from the pattern of the patterning device, the conditioning an additional beam of radiation, the imparting the additional beam of radiation with the additional pattern to form an additional patterned beam of radiation and projecting the additional patterned beam of radiation onto the target portion of the substrate are performed before or at the same time as the conditioning a beam of radiation. ### Claim 24 (depends on 16) A non-transitory computer readable medium comprising computer executable code, which, when loaded on a computer assembly, enables the computer assembly to control the method according to claim 16.