Plasma generator
AssigneeNissin Ion Equipment Co., Ltd.
InventorsHideki Fujita, Tetsuya Igo
Life of this patent
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Abstract
A plasma generator generates a plasma by ionizing a gas with a high-frequency discharge in a plasma generating chamber so that electrons from the plasma are emitted outside the plasma generator through an electron emitting hole. The plasma generator includes an antenna that is provided in the plasma generating chamber and that emits a high-frequency wave, and an antenna cover that is made of an insulating material and that covers an entire body of the antenna. A plasma electrode having the electron emitting hole is made of a conductive material. A frame cover with a protrusion ensures conductivity by preventing an insulating material from accumulating on a surface of the plasma electrode on a plasma side in sputtering by the plasma.
Claims1
A plasma generator that generates a plasma by ionizing a gas with a high-frequency discharge in a plasma generating chamber, and emits electrons outside from the plasma through an electron emitting hole, the plasma generator comprising:
- an antenna that is provided in the plasma generating chamber, and that emits a high-frequency wave;
- and an antenna cover that is made of an insulating material and that covers an entire body of the antenna, wherein a plasma electrode having the electron emitting hole is made of a conductive material, and the plasma electrode itself has a protruding structure,
- wherein a shadow is provided by the protruding structure, the plasma electrode having a first plasma electrode portion and a second plasma electrode portion, and the shadow prevents accumulation of an insulating material on the plasma electrode in sputtering by a plasma, and
- wherein the shadow is created on the first plasma electrode portion with the second plasma electrode portion.
Dependencies are inferred from the claim text.