# US 8,569,744 B2 · OLED display architecture

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- Number: US 8,569,744 B2
- Document ID: US8569744B2
- Status: Granted
- Kind: B2
- Application number: 12/639,541
- Filed: 2009-12-16
- Published: 2010-09-30
- Granted: 2013-10-29
- Earliest claimed: 2009-03-30
- Assignees: Universal Display Corporation
- Applicants: Michael S. Weaver
- Inventors: Michael S. Weaver
- Web page: https://patentgrep.com/patent/US8569744B2

## CPC

- G09G 3/3208: organic, e.g. using organic light-emitting diodes [OLED]
- H10K 50/11: characterised by the electroluminescent [EL] layers
- H10K 59/351: {comprising more than three subpixels, e.g. red-green-blue-white [RGBW]}
- G09G 2300/0452: Details of colour pixel setup, e.g. pixel composed of a red, a blue and two green components
- H10K 71/166: {using selective deposition, e.g. using a mask}
- G09G: ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION (arrangements for transferring data between digital computers and displays G06F3/14; static indicating arrangements comprising an association of a number of separate sources or light control cells G09F9/00; static indicating arrangements comprising integral associations of a number of light sources H01J, H01K, H10H, H05B33/12; scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission, details thereof H04N1/00)
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A device is provided. The device includes first, second and third subpixels. The first sub-pixel includes an emissive layer having a first emitting material but not a second emitting material. The second sub-pixel includes an emissive layer having the second emitting material but not the first emitting material. The third sub-pixel includes an emissive layer having both the first and second emitting materials. A method of fabricating the device is provided. For a three subpixel device, a first electrode layer is deposited, having a first sub-pixel and a second sub-pixel. Then, in a first patterned deposition process, a first emitting material is deposited on the first sub-pixel and the third sub-pixel, but not the second sub-pixel. Then, in a second patterned deposition process, a second emitting material is deposited on the second sub-pixel and the third sub-pixel, but not the first sub-pixel. Then, a second electrode layer is deposited. The first, second and third subpixels may be defined, for example, by patterning in either or both of the first and second electrode layers. Preferably, the device and method include a fourth subpixel.

## Claims

### Claim 1

A device, comprising:
a first sub-pixel comprising an emissive layer further comprising a first emitting material, wherein a second emitting material is not included in the first sub-pixel;
a second sub-pixel comprising an emissive layer further comprising the second emitting material, wherein the first emitting material is not included in the second sub-pixel;
a third sub-pixel comprising an emissive layer further comprising the first and second emitting materials; and
a fourth sub-pixel comprising an emissive layer further comprising a third emitting material,
wherein the third sub-pixel comprising an emissive layer further comprising the first, second and third emitting materials.

### Claim 2 (depends on 1)

The device of claim 1, wherein
the first sub-pixel emits light having a peak wavelength of 1-500 nm;
the second subpixel emits light having a peak wavelength of 500-600 nm;
the third subpixel emits light having a 1931 CIE coordinate of (x=0.26-0.37, y=0.27-0.38);
the fourth subpixel emits light having a peak wavelength of 600-700 nm.

### Claim 3 (depends on 1)

The device of claim 1, wherein the device is incorporated into a display.

### Claim 4 (depends on 1)

The device of claim 1, wherein the first, second and third emitting materials are phosphorescent.

### Claim 5

A device, comprising:
a first sub-pixel comprising an emissive layer further comprising a first emitting material, wherein a second emitting material is not included in the first sub-pixel;
a second sub-pixel comprising an emissive layer further comprising the second emitting material, wherein the first emitting material is not included in the second sub-pixel;
a third sub-pixel comprising an emissive layer further comprising the first and second emitting materials; and
a fourth sub-pixel comprising an emissive layer further comprising a third emitting material,
wherein the third sub-pixel comprising an emissive layer further comprising the first and second emitting materials and not the third emitting material.

### Claim 6 (depends on 5)

The device of claim 5, wherein:
the first sub-pixel emits light having a peak wavelength of 400-470 nm;
the second subpixel emits light having a peak wavelength of 500-600 nm;
the third subpixel emits light having a 1931 CIE coordinate of (x=0.10-0.20, y=0.15-0.45);
the fourth subpixel emits light having a peak wavelength of 600-700 nm.

### Claim 7 (depends on 5)

The device of claim 5, wherein:
the first sub-pixel emits light having a peak wavelength of 600-700 nm;
the second subpixel emits light having a peak wavelength of 500-600 nm;
the third subpixel emits light having a 1931 CIE coordinate of (x=0.40-0.63, y=0.36-0.55)
the fourth subpixel emits light having a peak wavelength of 400-500 nm.

### Claim 8 (depends on 5)

The device of claim 5, wherein the device is incorporated into a display.

### Claim 9 (depends on 5)

The device of claim 5, wherein the first, second and third emitting materials are phosphorescent.

### Claim 10

A method of fabricating a device having four sub-pixels, comprising:
depositing a first electrode layer having a first sub-pixel and a second sub-pixel;
in a first patterned deposition process, depositing a first emitting material on the first sub-pixel and the third sub-pixel, but not the second sub-pixel;
in a second patterned deposition process, depositing a second emitting material on the second sub-pixel and the third sub-pixel, but not the first sub-pixel;
depositing a second electrode layer, wherein at least one of the first and second electrode layers are patterned to define the first, second, third and fourth subpixels; and
in a third patterned deposition process, depositing a third emitting material on the fourth sub-pixel,
wherein the third emitting material is also deposited on the third subpixel.

### Claim 11 (depends on 10)

The method of claim 10, wherein a first non-emitting organic layer is deposited after depositing the first electrode layer and before the first and second patterned deposition processes, and wherein a second non-emitting organic layer is deposited after the first and second patterned deposition processes and before depositing the second electrode layer.

### Claim 12 (depends on 10)

The method of claim 10, wherein only three patterned deposition processes are used to deposit emitting materials on the first, second, third and fourth subpixels.

### Claim 13 (depends on 10)

The method of claim 10, wherein:
the third sub-pixel further comprises the third emitting material;
the first emitting material emits light having a peak wavelength of 400-500 nm;
the second emitting material emits light having a peak wavelength of 500-600 nm;
the combination of emitting materials present in the third subpixel emits light having a 1931 CIE coordinate of (x=0.26-0.37, y=0.27-0.38);
the third emitting material emits light having a peak wavelength of 600-700 nm.

### Claim 14 (depends on 10)

The method of claim 10, wherein the method is used to fabricate a display.

### Claim 15

A method of fabricating a device having four sub-pixels, comprising:
depositing a first electrode layer having a first sub-pixel and a second sub-pixel;
in a first patterned deposition process, depositing a first emitting material on the first sub-pixel and the third sub-pixel, but not the second sub-pixel;
in a second patterned deposition process, depositing a second emitting material on the second sub-pixel and the third sub-pixel, but not the first sub-pixel;
depositing a second electrode layer, wherein at least one of the first and second electrode layers are patterned to define the first, second, third and fourth subpixels; and
in a third patterned deposition process, depositing a third emitting material on the fourth sub-pixel,
wherein the third emitting material is not deposited on the third subpixel.

### Claim 16 (depends on 15)

The method of claim 15, wherein:
the first emitting material emits light having a peak wavelength of 400-470 nm;
the second emitting material emits light having a peak wavelength of 500-600 nm;
the combination of emitting materials present in the third subpixel emits light having a 1931 CIE coordinate of (x=0.10-0.20, y=0.15-0.45);
the third emitting material emits light having a peak wavelength of 600-700 nm.

### Claim 17 (depends on 15)

The method of claim 15, wherein:
the first emitting material emits light having a peak wavelength of 600-700 nm;
the second emitting material emits light having a peak wavelength of 500-600 nm;
the combination of emitting materials present in the third subpixel emits light having a 1931 CIE coordinate of (x=0.40-0.63, y=0.36-0.55);
the third emitting material emits light having a peak wavelength of 400-500 nm.

### Claim 18 (depends on 15)

The method of claim 15, wherein the method is used to fabricate a display.
