# US 8,569,723 B2 · Extreme ultraviolet light source apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,569,723 B2 - Document ID: US8569723B2 - Status: Granted - Kind: B2 - Application number: 13/183,217 - Filed: 2011-07-14 - Published: 2011-11-03 - Granted: 2013-10-29 - Earliest claimed: 2008-10-23 - Assignees: Gigaphoton Inc. - Applicants: Shinji Nagai; Takanobu Ishihara; Kouji Kakizaki; Tamotsu Abe - Inventors: Shinji Nagai; Takanobu Ishihara; Kouji Kakizaki; Tamotsu Abe - Web page: https://patentgrep.com/patent/US8569723B2 ## CPC - H05G 2/0025: {Systems for collecting the plasma generating material after the plasma generation} - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - G03F 7/70175: {Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source} - G03F 7/70916: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps} - H05G 2/007: {involving electric or magnetic fields in the process of plasma generation} - H05G 2/0094: {Reduction, prevention or protection from contamination; Cleaning} - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma. ## Claims ### Claim 1 An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target with a laser light, the extreme ultraviolet light source apparatus comprising: a magnetic field generator configured for generating a magnetic field region at a plasma region in which the plasma is to be generated and converging charged particles including ion emitted from the plasma region using the magnetic field; a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field; a target supply unit configured for supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber; a target collector located at a position opposite to the nozzle, the target collector configured for collecting a residual target which does not contribute to generation of the plasma; and a second charged particle collector (receiver) configured for covering the nozzle and reducing collisions of unconverged charged articles with the nozzle. ### Claim 2 (depends on 1) The apparatus according to claim 1, wherein at least the nozzle head is located within an obscuration region of the EUV light emitted from the plasma. ### Claim 3 (depends on 1) The apparatus according to claim 1, wherein at least a part of the target collector is located within an obscuration region of the EUV light emitted from the plasma. ### Claim 4 (depends on 1) The apparatus according to claim 1, wherein at least one or both of the target collector and the first charged particle collector (receiver) comprises: a liquescence portion configured for liquidizing a collected (received) material; and a drain portion configured for ejecting the material liquidized by the liquescence portion. ### Claim 5 (depends on 1) The apparatus according to claim 1, wherein the second charged particle collector (receiver) comprises: a liquescence portion configured for liquidizing a collected (received) material, and a drain portion configured for ejecting the material liquidized by the liquescence portion. ### Claim 6 (depends on 1) The apparatus according to claim 1, further comprising an electrostatic grid located at the front of the nozzle and having an aperture configured for letting the target passing through, wherein to the electrostatic grid, a predetermine voltage is impressed. ### Claim 7 (depends on 1) The apparatus according to claim 1, wherein the electrostatic grid is temperature-regulated. ### Claim 8 (depends on 1) The apparatus according to claim 1, further comprising a power supply electrically connected to the electrostatic grid, the power supply configured for impressing a positive electric potential to the electrostatic grid. ### Claim 9 (depends on 1) The apparatus according to claim 1, wherein the second charged particle collector (receiver) is grounded. ### Claim 10 An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target with a laser light, the extreme ultraviolet light source apparatus comprising: a target supply unit configured for supplying a target from a nozzle; a magnetic field generator configured for converging charged particles emitted from the plasma by forming a magnetic field at a region where the plasma is to be generated; a first charged particle collector (receiver) configured for collecting the charged particles converged by the magnetic field; and a second charged particle collector (receiver) configured for collecting charged particles without being converged by the magnetic field. ### Claim 11 (depends on 10) The apparatus according to claim 10, wherein the second charged particle collector (receiver) has a cylindrical shape configured for covering the nozzle and includes a thermal regulator configured for heating a material adhered to the second charged particle collector (receiver) to above a melting point of the material. ### Claim 12 (depends on 10) The apparatus according to claim 10, wherein the second charged particle collector (receiver) is grounded.