# US 8,569,719 B2 · Method and apparatus for specimen fabrication > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,569,719 B2 - Document ID: US8569719B2 - Status: Granted - Kind: B2 - Application number: 13/326,783 - Filed: 2011-12-15 - Published: 2012-04-12 - Granted: 2013-10-29 - Earliest claimed: 1997-07-22 - Assignees: Hitachi, Ltd. - Applicants: Satoshi Tomimatsu; Kaoru Umemura; Yuichi Madokoro; Yoshimi Kawanami; Yasunori Doi - Inventors: Satoshi Tomimatsu; Kaoru Umemura; Yuichi Madokoro; Yoshimi Kawanami; Yasunori Doi - Web page: https://patentgrep.com/patent/US8569719B2 ## CPC - G01N 1/32: Polishing; Etching - G01N 1/28: Preparing specimens for investigation {including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q}(mounting specimens on microscopic slides G02B21/34; means for supporting the objects or the materials to be analysed in electron microscopes H01J37/20 {; laboratory gas handling apparatus B01L5/00}) - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H01J 37/302: Controlling tubes by external information, e.g. program control (H01J37/304 takes precedence) - H01J 37/3056: {for microworking, e. g. etching of gratings or trimming of electrical components} - G01N 2001/028: {Sampling from a surface, swabbing, vaporising} - G01N 2001/045: {Laser ablation; Microwave vaporisation} - G01N 2001/282: {with mapping; Identification of areas; Spatial correlated pattern} - H01J 2237/2007: Holding mechanisms - H01J 2237/201: for mounting multiple objects - H01J 2237/202: Movement - H01J 2237/31732: Depositing thin layers on selected microareas - H01J 2237/31745: for preparing specimen to be viewed in microscopes or analyzed in microanalysers - H01J 2237/31749: Focused ion beam - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A focused ion beam apparatus, including: a sample holder provided with a fixing surface for fixing, via a deposition film, a micro-specimen extracted from a specimen using a method for fabrication by a focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen extracted from the specimen by the focused ion-beam fabrication method, to the sample holder; and a sample chamber in which the sample, the sample holder and the probe are laid out, wherein, in the sample chamber, the micro-specimen extracted from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of the sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam. ## Claims ### Claim 1 A focused ion beam apparatus, comprising: a sample stage for mounting a specimen; an ion beam irradiating optical system for irradiating a focused ion beam to the specimen; a deposition-gas supplying source for supplying a deposition gas used for forming a deposition film at an area to be irradiated with the focused ion beam; a sample holder provided with a fixing surface for fixing, via the deposition film, a micro-specimen separated from the specimen using a method for fabrication by the focused ion beam, in which a width of the fixing surface is smaller than 50 microns; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen separated from the specimen by the focused ion-beam fabrication method, to said sample holder; and a sample chamber in which said sample, said sample holder and at least a portion of said probe are laid out, wherein, in said sample chamber, the micro-specimen separated from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of said sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam. ### Claim 2 A focused ion beam apparatus, comprising: a sample stage for mounting a specimen; an ion beam irradiating optical system for irradiating a focused ion beam to the specimen; a deposition-gas supplying source for supplying a deposition gas used for forming a deposition film at an area to be irradiated with the focused ion beam; a sample holder provided with a fixing surface for fixing, via the deposition film, a micro-specimen separated from the specimen using a method for fabrication by the focused ion beam, in which a dent with depth of at least 20 microns is not provided on the fixing surface of said sample holder; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen separated from the specimen by the focused ion-beam fabrication method, to said sample holder; and a sample chamber in which said sample, said sample holder and at least a portion of said probe are laid out, wherein, in said sample chamber, the micro-specimen separated from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of said sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam. ### Claim 3 A focused ion beam apparatus, comprising: a sample stage for mounting a specimen; an ion beam irradiating optical system for irradiating a focused ion beam to the specimen; a deposition-gas supplying source for supplying a deposition gas used for forming a deposition film at an area to be irradiated with the focused ion beam; a sample holder provided with a fixing surface for fixing, via the deposition film, a micro-specimen separated from the specimen using a method for fabrication by the focused ion beam, in which a width of the fixing surface is smaller than 50 microns, and the fixing surface is flat so that the separated micro-specimen fixed to the fixing surface is not embedded in a dent on the fixing surface; a specimen transferring unit having a probe to which the specimen can be joined through the deposition film, and transferring the micro-specimen separated from the specimen by the focused ion-beam fabrication method, to said sample holder; and a sample chamber in which said sample, said sample holder and at least a portion of said probe are laid out, wherein, in said sample chamber, the micro-specimen separated from the specimen by the focused ion-beam fabrication method is fixed to the fixing surface of said sample holder through the deposition film, and the micro-specimen fixed to the fixing surface is fabricated by irradiating the focused ion beam. ### Claim 4 (depends on 1) The focused ion beam apparatus according to claim 1, wherein the sample holder is provided with a metallic wire. ### Claim 5 (depends on 1) The focused ion beam apparatus according to claim 1, wherein the fixing surface has a metallic surface. ### Claim 6 (depends on 1) The focused ion beam apparatus according to claim 1, wherein the sample holder is provided with a sliver of silicon. ### Claim 7 (depends on 1) The focused ion beam apparatus according to claim 1, wherein the fixing surface has a ground surface of silicon. ### Claim 8 (depends on 1) The focused ion beam apparatus according to claim 1, wherein the cross section of the sample holder is a convex shape. ### Claim 9 (depends on 2) The focused ion beam apparatus according to claim 2, wherein the sample holder is provided with a metallic wire. ### Claim 10 (depends on 2) The focused ion beam apparatus according to claim 2, wherein the fixing surface has a metallic surface. ### Claim 11 (depends on 2) The focused ion beam apparatus according to claim 2, wherein the sample holder is provided with a sliver of silicon. ### Claim 12 (depends on 2) The focused ion beam apparatus according to claim 2, wherein the fixing surface has a ground surface of silicon. ### Claim 13 (depends on 2) The focused ion beam apparatus according to claim 2, wherein the cross section of the sample holder is a convex shape. ### Claim 14 (depends on 3) The focused ion beam apparatus according to claim 3, wherein the sample holder is provided with a metallic wire. ### Claim 15 (depends on 3) The focused ion beam apparatus according to claim 3, wherein the fixing surface has a metallic surface. ### Claim 16 (depends on 3) The focused ion beam apparatus according to claim 3, wherein the sample holder is provided with a sliver of silicon. ### Claim 17 (depends on 3) The focused ion beam apparatus according to claim 3, wherein the fixing surface has a ground surface of silicon. ### Claim 18 (depends on 3) The focused ion beam apparatus according to claim 3, wherein the cross section of the sample holder is a convex shape.