# US 8,569,718 B2 · Charged particle beam system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,569,718 B2 - Document ID: US8569718B2 - Status: Granted - Kind: B2 - Application number: 12/913,403 - Filed: 2010-10-27 - Published: 2011-06-23 - Granted: 2013-10-29 - Earliest claimed: 2009-12-23 - Assignees: Nanobeam Limited - Applicants: Tao Zhang - Inventors: Tao Zhang - Web page: https://patentgrep.com/patent/US8569718B2 ## CPC - H01J 37/185: {Means for transferring objects between different enclosures of different pressure or atmosphere} - B25J 21/00: Chambers provided with manipulation devices (constructional features of the mounting of the manipulator in the wall B25J1/08 {; glove-boxes for nuclear applications G21F7/04}) - B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic - B82Y 40/00: Manufacture or treatment of nanostructures - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H01J 37/3174: {Particle-beam lithography, e.g. electron beam lithography} - H10P 72/0471: {comprising at least one ion or electron beam chamber} - H10P 72/10: using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] - H10P 72/3302: {Mechanical parts of transfer devices} - H10P 72/3304: {characterised by movements or sequence of movements of transfer devices} - H10P 72/3306: {Horizontal transfer of a single workpiece} - H01J 2237/184: Vacuum locks - H01J 2237/2007: Holding mechanisms - H01J 2237/204: Means for introducing and/or outputting objects - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - B25J: MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES ({manipulators specially adapted for use in surgery A61B34/70; manipulators used in cleaning hollow articles B08B9/04}; manipulators associated with rolling mills B21B39/20; manipulators associated with forging machines B21J13/10; {manipulators associated with picking-up and placing mechanisms B23P19/007}; means for holding wheels or parts thereof B60B30/00; {vehicles with ground-engaging propulsion means, e.g. walking members B62D57/02, B62D57/032; devices for picking-up and depositing articles or materials between conveyors B65G47/90, B65G47/91; manipulators with gripping or holding means for transferring packages B65H67/065}; cranes B66C; {manipulators used in the protection or supervision of pipe-line installations F17D5/00; walking equipment adapted for nuclear steam-generators F22B37/006}; manipulators specially adapted for, or associated with, nuclear reactors G21C; {apparatus used for handling wafers during manufacture or treatment of semiconductor H10P72/50}) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract In the embodiment a charged particle beam system includes a main chamber, an exchange chamber, an x-y positioning stage housed in the main chamber, a substrate-supporting structure supported by or provided by said stage and moveable in first and second perpendicular directions of travel between limits which define a field of travel and a substrate handling device housed inside the main chamber for loading and unloading a substrate into and out of the main chamber, the device comprising a bar and a side member for supporting the substance to one side of the bar. A method of loading a substrate in a charged particle beam system is also disclosed. ## Claims ### Claim 1 A charged particle beam system including: a main chamber; an exchange chamber; an x-y positioning stage housed in the main chamber; a substrate-supporting structure supported by or provided by said stage and moveable in first and second perpendicular directions of travel between limits which define a field of travel; and a substrate handling device housed inside the main chamber for loading and unloading a substrate into and out of the main chamber, the device comprising a bar and a side member, the substrate handling device configured to translate the bar along its longitudinal axis parallel to the first direction of travel and the side member extending laterally from the bar, parallel to the second direction, for supporting the substrate to one side of the bar; wherein the substrate-supporting structure has a loading/unloading position at a limit of travel along the first direction and a limit of travel along the second direction, wherein the substrate-supporting structure and the substrate handling device are positioned so that the substrate can be lifted up from and set down on the substrate-supporting structure when the substrate-supporting structure is in the loading/unloading position and when the side member is in a loading/unloading position; wherein the substrate-supporting structure and/or a substrate supported by the substrate-supporting structure has a part which is closest to the limit of travel in the second direction and which defines a line extending along the second direction which is the limit of extent of the part towards the limit of travel in the first direction, wherein the side member is shaped so that, when it is in its loading/unloading position lies, it does not cross the line, whereby the substrate-supporting structure is free to move in the second direction without the side member interfering with the substrate-supporting structure and/or a substrate. ### Claim 2 (depends on 1) A system according to claim 1, wherein the substrate-supporting structure comprises a laser interferometer mirror assembly. ### Claim 3 (depends on 1) A system according to claim 1, wherein the substrate-supporting structure comprises a base and three or more supports upstanding from base. ### Claim 4 (depends on 3) A system according to claim 3, wherein the substrate-supporting structure part which is closest to the limit of travel in the second direction and which defines the line extending along the second direction is an edge or corner of a support. ### Claim 5 (depends on 1) A system according to claim 1, wherein the substrate includes a substrate support. ### Claim 6 (depends on 1) A system according to claim 1, wherein the substrate-supporting structure includes three or more grooves for receiving respective feet of a substrate support. ### Claim 7 (depends on 1) A system according to claim 1, wherein the first direction is the x-axis and the second direction is the y-axis. ### Claim 8 (depends on 1) A system according to claim 1, wherein the wing has an edge which furthest away from the exchange chamber along the first direction which, inside the field of travel, is straight along the second direction. ### Claim 9 (depends on 1) A system according to claim 1, wherein the wing has an edge which is generally further away from the exchange chamber along the first direction which, inside the field of travel, is stepped or sloped, but which does not cross the line defined by the substrate-supporting structure part which is closest to the limit of travel in the second direction. ### Claim 10 (depends on 1) A system according to claim 1, wherein the wing has an edge which furthest away from the rest of the substrate-exchange device along the second direction which is straight along the first direction. ### Claim 11 (depends on 1) A system according to claim 1, wherein the wing has an edge which is generally closest to the exchange chamber along the first direction which, inside the field of travel, is stepped or sloped. ### Claim 12 (depends on 1) A system according to claim 1, wherein the wing is configured to lie under the substrate. ### Claim 13 (depends on 1) A system according to claim 1, wherein the wing includes three or more grooves for receiving respective feet of a substrate support. ### Claim 14 A method of loading a substrate in a charged particle beam system, the method comprising: positioning a substrate-supporting structure in a loading position; positioning a substrate handling device in a loading position; lowering the substrate handling device or raising the substrate-supporting structure so as to set the substrate down onto the substrate-supporting structure; and moving the substrate-supporting structure from its loading position without moving the substrate handling device from its loading position. ### Claim 15 (depends on 14) A method according to claim 14, wherein the substrate-supporting structure is movable in first and second orthogonal directions, wherein the substrate handling device is moveable in the first direction, but not the second direction and wherein moving the substrate-supporting structure from its loading position comprises initially moving the substrate-supporting structure in the second direction, optionally, only in the second direction.