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US 8,569,692 B1Granted
Measurement system with thickness calculation and method of operation thereof
AssigneeApplied Materials, Inc.
InventorsBiao Liu, Chikuang Wang, Yuri Uritsky
Life of this patent
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Abstract
A method of operation of a measurement system includes: providing a specimen having a film; controlling a beam generator to direct a charged particle beam into the specimen; detecting a reference signal emitted from the specimen; normalizing the reference signal to create a film L-ratio; and determining a thickness of the film by correlating the film L-ratio to a calibration curve.
Claims20
A method of operation of a measurement system comprising:
- providing a specimen having a film;
- controlling a beam generator to direct a charged particle beam into the specimen;
- detecting a reference signal emitted from the specimen;
- normalizing the reference signal to create a film L-ratio;
- and
- determining a thickness of the film by correlating the film L-ratio to a calibration curve.
3 more elements
A method of operation of a measurement system comprising:
- providing a specimen having a film with a pattern;
- controlling a beam generator to direct a charged particle beam into the specimen;
- detecting a reference signal emitted from the specimen;
- normalizing the reference signal to create a film L-ratio;
- and
- determining a thickness of the film by correlating the film L-ratio to a calibration curve.
3 more elements
A measurement system comprising:
- a control module for providing a specimen having a film;
- a beam generator, coupled to the control module, for directing a charged particle beam into the specimen;
- a detector, coupled to the beam generator, for detecting an reference signal emitted from the specimen;
- and
- an analysis unit, coupled to the detector, for normalizing the reference signal to create a film L-ratio and determining a thickness of the film by correlating the film L-ratio to a calibration curve.
2 more elements
Dependencies are inferred from the claim text.