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US 8,569,119 B2Granted
Method for producing semiconductor device and display device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorShunpei Yamazaki
Life of this patent
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Abstract
A step of forming wiring using first solution ejection means for ejecting a conductive material, a step of forming a resist mask on the wiring using second solution ejection means, and a step of etching the wiring using an atmospheric-pressure plasma device having linear plasma generation means or an atmospheric-pressure plasma device having a plurality of linearly-arranged plasma-generation-means using the resist mask as a mask are included.
Claims14
A method for producing a display device comprising:
- forming a wiring by ejecting a first solution comprising a conductive material using a first solution ejector having solution ejection ports with moving the first solution ejector;
- and
- etching the wiring using a plasma device having a linear plasma generator by generating plasma between a first electrode of the linear plasma generator and a second electrode surrounding the first electrode of the linear plasma generator at an atmospheric pressure or near-atmospheric pressure,
- wherein at least the first electrode has a sheet-like shape.
1 more element
A method for producing a display device comprising:
- forming a wiring by ejecting a first solution comprising a conductive material using a first solution ejector having solution ejection ports with moving the first solution ejector,
- forming a resist mask on the wiring;
- and
- etching the wiring using a plasma device having a linear plasma generator using the resist mask as a mask by generating plasma between a first electrode of the linear plasma generator and a second electrode surrounding the first electrode of the linear plasma generator at an atmospheric pressure or near-atmospheric pressure,
- wherein at least the first electrode has a sheet-like shape.
2 more elements
Dependencies are inferred from the claim text.