Method of manufacturing mask for depositing thin film
AssigneeSamsung Display Co., Ltd.
InventorsSang-Shin Lee, Jung-Woo Ko
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Abstract
A method of manufacturing a mask for depositing a thin film is disclosed. In one embodiment, the method includes i) providing a raw material substrate for a deposition mask; ii) removing a portion of the raw material substrate to form a pattern, wherein a plurality of openings are defined in the pattern; and iii) irradiating at least a laser beam onto the openings of the pattern at an inclination angle with respect to the raw material substrate such that inclined portions are formed at the side surfaces of each of the openings of the pattern.
Claims10
A method of manufacturing a mask for depositing a thin film, the method comprising:
- providing a raw material substrate for a deposition mask;
- removing a portion of the raw material substrate to form a pattern, wherein a plurality of openings are defined in the pattern;
- and
- irradiating at least a laser beam onto the openings of the pattern at an inclination angle with respect to the raw material substrate such that inclined portions are formed at the side surfaces of each of the openings of the pattern,
- wherein the irradiating comprises emitting the laser beam and a water jet together,
- and wherein the irradiating comprises adjusting a direction of a water jet nozzle for ejecting the water jet to form the inclination angle between the water jet nozzle and the raw material substrate.
Dependencies are inferred from the claim text.