Underlayer composition and process thereof
AssigneeAZ Electronic Materials USA Corp.
InventorsHuirong Yao, Guanyang Lin, Zachary Bogusz, PingHung Lu, WooKyu Kim, Mark Neisser
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Abstract
The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
Claims20
An underlayer composition comprising an organic titanate compound and a polymer, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group.
Dependencies are inferred from the claim text.