Resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKoji Ichikawa, Satoshi Yamaguchi
Life of this patent
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Abstract
A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; ring W1 represents a C2 to C36 substituted heterocyclic ring; R3 represents a C1 to C30 hydrocarbon group, and one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—.
Claims7
A resist composition comprising;
- (A1) a resin having a structural unit represented by the formula (I),
- (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid,
- (B) an acid generator, and
- (D) a compound represented by the formula (II),
- wherein R1 represents a hydrogen atom or a methyl group;
- A1 represents a C1 to C6 alkanediyl group;
- R2 represents a C1 to C10 hydrocarbon group having a fluorine atom;
- wherein ring W1 represents a C2 to C36 substituted heterocyclic ring;
- R3 represents a C1 to C30 hydrocarbon group, and one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—.
Dependencies are inferred from the claim text.