Organic thin film forming method, auxiliary agent for forming an organic thin film, and solution for forming an organic thin film

A method for forming an organic thin film on a substrate surface comprising the successive steps of:

• obtaining an auxiliary agent for forming the organic thin film by an interaction between a first metal surfactant having at least one hydrolytic group and a compound capable of interacting with the first metal surfactant in an organic solvent;
• obtaining a solution for forming the organic thin film from the auxiliary agent and a second metal surfactant in an organic solvent;
• and
• contacting the substrate with the solution for forming the organic thin film;
• wherein:
• a moisture content in the solution for forming the organic thin film is adjusted or maintained to 50 to 1000 ppm;
• the auxiliary agent for forming the organic thin film contains 0.5 to 3.0 moles of the first surfactant per 1 mole of the compound capable of interacting with the first metal surfactant;
• a solid content in the auxiliary agent for forming the organic thin film in terms of the number of moles as oxide is 0.001 to 1 mole per 1 mole of the second metal surfactant;
• the first metal surfactant is a compound represented by formula (I):
• R1nMXm-n (I)
• where:
• R1 represents:
• an optionally substituted alkyl having 10 to 30 carbon atoms,
• an optionally substituted fluorinated alkyl group having 10 to 30 carbon atoms,
• an alkyl group having 10 to 30 carbon atoms and containing a linking group selected from —O— and —SO2—, or
• a fluorinated alkyl group having 10 to 30 carbon atoms and containing a linking group selected from —O— and —SO2—,
• M represents a silicon atom,
• X represents a hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, or an acyloxy group having 1 to 4 carbon atoms,
• m represents the valence of M,
• n represents 1, and
• X may be the same or different when (m-n) is 2 or more;
• the compound capable of interacting with the first metal surfactant is at least one type selected from the group consisting of a metal oxide, a metal alkoxide, a partial hydrolysis product of a metal alkoxide, a silanol condensation catalyst, and an acid catalyst;
• the metal of the metal alkoxide or the partial hydrolysis product of the metal alkoxide is at least one type selected from the group consisting of titanium, zirconium, aluminum, silicon, germanium, indium, tin, tantalum, zinc, tungsten, and lead;
• and
• the second metal surfactant is a compound represented by formula (III):
• R11n1M1X1m1-n1 (III)
• where:
• R11 represents:
• an optionally substituted alkyl group having 10 to 30 carbon atoms,
• an optionally substituted fluorinated alkyl group having 10 to 30 carbon atoms,
• an alkyl group having 10 to 30 carbon atoms and containing a linking group selected from —O— and —SO2—, or
• a fluorinated alkyl group having 10 to 30 carbon atoms and containing a linking group selected from —O— and —SO2—,
• M1 represents a silicon atom,
• X1 represents a hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, or an acyloxy group having 1 to 4 carbon atoms,
• m1 represents the valence of M,
• n1 represents 1, and
• X1 may be the same or different when (m1-n1) is 2 or more.